Nezasa, R.; Gotoh, K.; Kato, S.; Miyamoto, S.; Usami, N.; Kurokawa, Y.
Fabrication of Silicon Nanowire Metal-Oxide-Semiconductor Capacitors with Al2O3/TiO2/Al2O3 Stacked Dielectric Films for the Application to Energy Storage Devices. Energies 2021, 14, 4538.
https://doi.org/10.3390/en14154538
AMA Style
Nezasa R, Gotoh K, Kato S, Miyamoto S, Usami N, Kurokawa Y.
Fabrication of Silicon Nanowire Metal-Oxide-Semiconductor Capacitors with Al2O3/TiO2/Al2O3 Stacked Dielectric Films for the Application to Energy Storage Devices. Energies. 2021; 14(15):4538.
https://doi.org/10.3390/en14154538
Chicago/Turabian Style
Nezasa, Ryota, Kazuhiro Gotoh, Shinya Kato, Satoru Miyamoto, Noritaka Usami, and Yasuyoshi Kurokawa.
2021. "Fabrication of Silicon Nanowire Metal-Oxide-Semiconductor Capacitors with Al2O3/TiO2/Al2O3 Stacked Dielectric Films for the Application to Energy Storage Devices" Energies 14, no. 15: 4538.
https://doi.org/10.3390/en14154538
APA Style
Nezasa, R., Gotoh, K., Kato, S., Miyamoto, S., Usami, N., & Kurokawa, Y.
(2021). Fabrication of Silicon Nanowire Metal-Oxide-Semiconductor Capacitors with Al2O3/TiO2/Al2O3 Stacked Dielectric Films for the Application to Energy Storage Devices. Energies, 14(15), 4538.
https://doi.org/10.3390/en14154538