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Review

Technostress Dark Side of Technology in the Workplace: A Scientometric Analysis

1
Department of Human Science, Università Europea di Roma, 00163 Roma, Italy
2
Social Matters Research Group, Universidad Loyola Andalucía, 14004 Córdoba, Spain
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Faculty of Business Administration, Universidad Autónoma de Chile, Santiago 7500912, Chile
4
Faculty of Education, Pontificia Universidad Católica de Chile, Santiago 7820436, Chile
5
Education Research Center, Universidad Bernardo O’Higgins, Santiago 8370993, Chile
*
Author to whom correspondence should be addressed.
Int. J. Environ. Res. Public Health 2020, 17(21), 8013; https://doi.org/10.3390/ijerph17218013
Received: 14 September 2020 / Revised: 22 October 2020 / Accepted: 27 October 2020 / Published: 30 October 2020
This article aims to provide a critical review of the scientific research on technostress. As such, global references in this field are identified and highlighted in order to manage pre-existing knowledge and establish future ‘bridges’ among researchers, and to enhance the presently dispersed understanding of this subject. A scientometric meta-analysis of publications on technostress was conducted to achieve this objective. Mainstream journals from the Web of Science (WoS) were used to identify current topics, relevant journals, prolific authors, institutions, and countries, ‘schools of thought’ and the thematic areas around which current technostress debate revolves. In this article a significant contribution comes from the use of the scientific activity itself, together with scientometric meta-analysis techniques and the application of this scientific activity, its impact and relational character, to discover relevant countries, research organizations and authors which can constitute a global reference to demarcate this knowledge frontier, and who lead the ‘critical mass’ of global technostress researchers. This study also distinguishes between the relevant themes studied, with co-keywords plus bibliographic coupling citation, and examines the kind of stress the most prolific authors have considered and, therefore, to discover those topics which should be studied further to deepen this research field, in search of a post-disciplinary knowledge that allows unity of focus in technology and psychology. View Full-Text
Keywords: mental health; technostress; information-technology; dark side; work; information overload; scientometrics mental health; technostress; information-technology; dark side; work; information overload; scientometrics
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MDPI and ACS Style

Bondanini, G.; Giorgi, G.; Ariza-Montes, A.; Vega-Muñoz, A.; Andreucci-Annunziata, P. Technostress Dark Side of Technology in the Workplace: A Scientometric Analysis. Int. J. Environ. Res. Public Health 2020, 17, 8013. https://doi.org/10.3390/ijerph17218013

AMA Style

Bondanini G, Giorgi G, Ariza-Montes A, Vega-Muñoz A, Andreucci-Annunziata P. Technostress Dark Side of Technology in the Workplace: A Scientometric Analysis. International Journal of Environmental Research and Public Health. 2020; 17(21):8013. https://doi.org/10.3390/ijerph17218013

Chicago/Turabian Style

Bondanini, Giorgia, Gabriele Giorgi, Antonio Ariza-Montes, Alejandro Vega-Muñoz, and Paola Andreucci-Annunziata. 2020. "Technostress Dark Side of Technology in the Workplace: A Scientometric Analysis" International Journal of Environmental Research and Public Health 17, no. 21: 8013. https://doi.org/10.3390/ijerph17218013

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