Choi, Y.; Han, C.; Shin, J.; Moon, S.; Min, J.; Park, H.; Eom, D.; Lee, J.; Shin, C.
Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO2 Ferroelectric Capacitor. Sensors 2022, 22, 4087.
https://doi.org/10.3390/s22114087
AMA Style
Choi Y, Han C, Shin J, Moon S, Min J, Park H, Eom D, Lee J, Shin C.
Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO2 Ferroelectric Capacitor. Sensors. 2022; 22(11):4087.
https://doi.org/10.3390/s22114087
Chicago/Turabian Style
Choi, Yejoo, Changwoo Han, Jaemin Shin, Seungjun Moon, Jinhong Min, Hyeonjung Park, Deokjoon Eom, Jehoon Lee, and Changhwan Shin.
2022. "Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO2 Ferroelectric Capacitor" Sensors 22, no. 11: 4087.
https://doi.org/10.3390/s22114087
APA Style
Choi, Y., Han, C., Shin, J., Moon, S., Min, J., Park, H., Eom, D., Lee, J., & Shin, C.
(2022). Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO2 Ferroelectric Capacitor. Sensors, 22(11), 4087.
https://doi.org/10.3390/s22114087