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Open AccessArticle

UV-Writing of a Superstructure Waveguide Bragg Grating in a Planar Polymer Substrate

1
Applied Laser and Photonics Group, University of Applied Sciences Aschaffenburg, 63743 Aschaffenburg, Germany
2
Institute of Microwaves and Photonics, University of Erlangen-Nuremberg, 91054 Erlangen, Germany
*
Author to whom correspondence should be addressed.
Sensors 2017, 17(9), 1964; https://doi.org/10.3390/s17091964
Received: 8 August 2017 / Revised: 22 August 2017 / Accepted: 23 August 2017 / Published: 25 August 2017
(This article belongs to the Special Issue Fiber Bragg Grating Based Sensors)
We report on the fabrication of a superstructure Bragg grating in a planar polymer substrate. Based on a twofold illumination process an integrated waveguide and a superstructure Bragg grating are subsequently written into bulk polymethylmethacrylate by UV-induced refractive index modification. The measured reflected spectrum of the superstructure Bragg grating exhibits multiple reflection peaks and is in good agreement with performed standard simulations based on the beam propagation method and coupled mode theory algorithms. By applying a varying tensile load we determine the strain sensitivity to be about 1.10 pm/µε and demonstrate the applicability of the superstructure Bragg grating for strain measurements with redundant sensing signals. View Full-Text
Keywords: planar Bragg grating; polymer; phase mask; integrated waveguide; excimer laser planar Bragg grating; polymer; phase mask; integrated waveguide; excimer laser
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MDPI and ACS Style

Rosenberger, M.; Schmauss, B.; Hellmann, R. UV-Writing of a Superstructure Waveguide Bragg Grating in a Planar Polymer Substrate. Sensors 2017, 17, 1964.

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