Article Versions Notes

Czwartos J, Budner B, Bartnik A, Wachulak P, Butruk-Raszeja BA, Lech A, Ciach T, Fiedorowicz H. Effect of Extreme Ultraviolet (EUV) Radiation and EUV Induced, N₂ and O₂ Based Plasmas on a PEEK Surface’s Physico-Chemical Properties and MG63 Cell Adhesion. International Journal of Molecular Sciences. 2021; 22(16):8455. https://doi.org/10.3390/ijms22168455

Czwartos, Joanna, Bogusław Budner, Andrzej Bartnik, Przemysław Wachulak, Beata A. Butruk-Raszeja, Adam Lech, Tomasz Ciach, and Henryk Fiedorowicz. 2021. "Effect of Extreme Ultraviolet (EUV) Radiation and EUV Induced, N₂ and O₂ Based Plasmas on a PEEK Surface’s Physico-Chemical Properties and MG63 Cell Adhesion" International Journal of Molecular Sciences 22, no. 16: 8455. https://doi.org/10.3390/ijms22168455

Czwartos, J., Budner, B., Bartnik, A., Wachulak, P., Butruk-Raszeja, B. A., Lech, A., Ciach, T., & Fiedorowicz, H. (2021). Effect of Extreme Ultraviolet (EUV) Radiation and EUV Induced, N₂ and O₂ Based Plasmas on a PEEK Surface’s Physico-Chemical Properties and MG63 Cell Adhesion. International Journal of Molecular Sciences, 22(16), 8455. https://doi.org/10.3390/ijms22168455