Kaczmarek-Szczepańska, B.; Wekwejt, M.; Mazur, O.; Zasada, L.; Pałubicka, A.; Olewnik-Kruszkowska, E.
The Physicochemical and Antibacterial Properties of Chitosan-Based Materials Modified with Phenolic Acids Irradiated by UVC Light. Int. J. Mol. Sci. 2021, 22, 6472.
https://doi.org/10.3390/ijms22126472
AMA Style
Kaczmarek-Szczepańska B, Wekwejt M, Mazur O, Zasada L, Pałubicka A, Olewnik-Kruszkowska E.
The Physicochemical and Antibacterial Properties of Chitosan-Based Materials Modified with Phenolic Acids Irradiated by UVC Light. International Journal of Molecular Sciences. 2021; 22(12):6472.
https://doi.org/10.3390/ijms22126472
Chicago/Turabian Style
Kaczmarek-Szczepańska, Beata, Marcin Wekwejt, Olha Mazur, Lidia Zasada, Anna Pałubicka, and Ewa Olewnik-Kruszkowska.
2021. "The Physicochemical and Antibacterial Properties of Chitosan-Based Materials Modified with Phenolic Acids Irradiated by UVC Light" International Journal of Molecular Sciences 22, no. 12: 6472.
https://doi.org/10.3390/ijms22126472
APA Style
Kaczmarek-Szczepańska, B., Wekwejt, M., Mazur, O., Zasada, L., Pałubicka, A., & Olewnik-Kruszkowska, E.
(2021). The Physicochemical and Antibacterial Properties of Chitosan-Based Materials Modified with Phenolic Acids Irradiated by UVC Light. International Journal of Molecular Sciences, 22(12), 6472.
https://doi.org/10.3390/ijms22126472