Wang, J.; Shi, H.; Gong, J.; Tian, G.; Yao, J.
Electrochromic Fabrics with Horizontal Patterning, Enhanced Strength, Comfort, High-Temperature Protection, and Long Coloring Retention Properties for Adaptive Camouflage. Molecules 2025, 30, 1249.
https://doi.org/10.3390/molecules30061249
AMA Style
Wang J, Shi H, Gong J, Tian G, Yao J.
Electrochromic Fabrics with Horizontal Patterning, Enhanced Strength, Comfort, High-Temperature Protection, and Long Coloring Retention Properties for Adaptive Camouflage. Molecules. 2025; 30(6):1249.
https://doi.org/10.3390/molecules30061249
Chicago/Turabian Style
Wang, Jingjing, Haiting Shi, Jixian Gong, Geng Tian, and Jinbo Yao.
2025. "Electrochromic Fabrics with Horizontal Patterning, Enhanced Strength, Comfort, High-Temperature Protection, and Long Coloring Retention Properties for Adaptive Camouflage" Molecules 30, no. 6: 1249.
https://doi.org/10.3390/molecules30061249
APA Style
Wang, J., Shi, H., Gong, J., Tian, G., & Yao, J.
(2025). Electrochromic Fabrics with Horizontal Patterning, Enhanced Strength, Comfort, High-Temperature Protection, and Long Coloring Retention Properties for Adaptive Camouflage. Molecules, 30(6), 1249.
https://doi.org/10.3390/molecules30061249