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Journal: Entropy, 2020
Volume: 22
Number: 234
Article:
Diffusion Barrier Performance of AlCrTaTiZr/AlCrTaTiZr-N High-Entropy Alloy Films for Cu/Si Connect System
Authors:
by
Chunxia Jiang, Rongbin Li, Xin Wang, Hailong Shang, Yong Zhang and Peter K. Liaw
Link:
https://www.mdpi.com/1099-4300/22/2/234
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