Search Results (3)

We report the use of four-layer graphene (4LG) as a highly reliable transparent conductive electrode (TCE) for polymer-dispersed liquid crystal (PDLC)-based smart window devices. The adhesion between 4LG and the substrate was successfully improved through a water-induced interface-cleaning (WIIC) process. We compared the performance of a device with a WIIC-processed 4LG electrode with that of devices with a conventional indium tin oxide (ITO) electrode and a 4LG electrode without a WIIC. With the application of the WIIC process, the PDLC smart window with a 4LG electrode exhibited reduced turn-on voltage and haze compared to 4LG without the WIIC process and characteristics comparable to those of the ITO electrode. The WIIC-processed 4LG electrode demonstrated enhanced electrical properties and better optical performance, leading to improved device efficiency and reliability. Furthermore, our study revealed that the WIIC process not only improved the adhesion between 4LG and the substrate but also enhanced the compatibility and interfacial interactions, resulting in the superior performance of the smart window device. These findings suggest that 4LG with WIIC holds great promise as a transparent conductive electrode for flexible smart windows, offering a cost-effective and efficient alternative to conventional ITO electrodes. Full article

Isopropyl alcohol (IPA) has been conventionally used for pre-cleaning processes. As the device size decreased, the gate oxide layer became thinner. As a result, the quality of the gate oxide was degraded by a pre-cleaning process, and oxide reliabilities and product yield were affected. In this study, we investigate whether the carbon generated on the silicon interface after the IPA drying process might have induced gate oxide breakdown. Time-dependent dielectric breakdown (TDDB) failure increased in frequency since carbon contaminations were increased in the oxide according to the amount of IPA. Organic contaminations resulted in a lower energy level, and electron tunneling occurred through the gate oxide. When an external electric field was applied, organic materials in the gate oxide layer were aligned, and a percolation path formed to cause breakdown. Finally, we suggest a new cleaning method using carbon-free O₃ deionized (DI) water as a dry-cleaning method to improve oxide dielectric breakdown. An O₃ DI dry cleaning process could reduce carbon particles in the oxide layer and decrease gate oxide failure by 7%. Full article

TiO₂ thin films are used extensively for a broad range of applications including environmental remediation, self-cleaning technologies (windows, building exteriors, and textiles), water splitting, antibacterial, and biomedical surfaces. While a broad range of methods such as wet-chemical synthesis techniques, chemical vapor deposition (CVD), and physical vapor deposition (PVD) have been developed for preparation of TiO₂ thin films, PVD techniques allow a good control of the homogeneity and thickness as well as provide a good film adhesion. On the other hand, the choice of the PVD technique enormously influences the photocatalytic performance of the TiO₂ layer to be deposited. Three important parameters play an important role on the photocatalytic performance of TiO₂ thin films: first, the different pathways in crystallization (nucleation and growth); second, anatase/rutile formation; and third, surface area at the interface to the reactants. This study aims to provide a review regarding some strategies developed by our research group in recent years to improve the photocatalytic performance of TiO₂ thin films. An innovative approach, which uses thermally induced nanocrack networks as an effective tool to enhance the photocatalytic performance of sputter deposited TiO₂ thin films, is presented. Plasmonic and non-plasmonic enhancement of photocatalytic performance by decorating TiO₂ thin films with metallic nanostructures are also briefly discussed by case studies. In addition to remediation applications, a new approach, which utilizes highly active photocatalytic TiO₂ thin film for micro- and nanostructuring, is also presented. Full article