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Keywords = vacuum-arc plasma-assisted deposition method

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12 pages, 2764 KiB  
Article
Structure and Properties of CrN/TiN Multi-Layer Coatings Obtained by Vacuum-Arc Plasma-Assisted Deposition Method
by Andrey A. Leonov, Yuliya A. Denisova, Vladimir V. Denisov, Maxim S. Syrtanov, Alexander N. Shmakov, Viktor M. Savostikov and Anton D. Teresov
Coatings 2023, 13(2), 351; https://doi.org/10.3390/coatings13020351 - 3 Feb 2023
Cited by 20 | Viewed by 3609
Abstract
The paper presents the study results of CrN/TiN multi-layer coatings, as well as single-layer TiN and CrN coatings on Cr12MoV cold work die steel deposited by the vacuum-arc plasma-assisted method. Three CrN/TiN coatings of 8-, 16-, and 32-layers were deposited, in which the [...] Read more.
The paper presents the study results of CrN/TiN multi-layer coatings, as well as single-layer TiN and CrN coatings on Cr12MoV cold work die steel deposited by the vacuum-arc plasma-assisted method. Three CrN/TiN coatings of 8-, 16-, and 32-layers were deposited, in which the thickness of each layer was 500 nm, 250 nm and 125 nm, respectively. All of the coatings reveal a face-centered cubic structure with highly oriented (111) growth. The hardness of the CrN/TiN multi-layer coatings was about 27 GPa. Changing the architecture of CrN/TiN multi-layer coatings by reducing the thickness of the CrN and TiN layers from 500 nm to 125 nm promotes a smooth decrease in both the wear parameter and the coefficient of friction. By using an X-ray phase analysis with synchrotron radiation, it was found that 32-layer CrN/TiN coating retained thermal stability during heating in air to a temperature of 1120–1125 °C, and in a vacuum at least to a temperature of 1200 °C. Full article
(This article belongs to the Special Issue Electron-Ion-Plasma Technology Applied to Surface Engineering)
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33 pages, 1328 KiB  
Review
Thin Film Deposition Using Energetic Ions
by Darina Manova, Jürgen W. Gerlach and Stephan Mändl
Materials 2010, 3(8), 4109-4141; https://doi.org/10.3390/ma3084109 - 29 Jul 2010
Cited by 84 | Viewed by 15941
Abstract
One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high [...] Read more.
One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high power impulse magnetron sputtering and plasma immersion ion implantation, are available. However, there are obstacles to overcome in all technologies, including line-of-sight processes, particle contaminations and low growth rates, which lead to ongoing process refinements and development of new methods. Concerning the deposited thin films, control of energetic ion bombardment leads to improved adhesion, reduced substrate temperatures, control of intrinsic stress within the films as well as adjustment of surface texture, phase formation and nanotopography. This review illustrates recent trends for both areas; plasma process and solid state surface processes. Full article
(This article belongs to the Special Issue Advances in Surface Coatings)
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