Sign in to use this feature.

Years

Between: -

Subjects

Journals

Article Types

Countries / Regions

Search Results (1)

Search Parameters:
Keywords = through-pellicle imaging

Order results
Result details
Results per page
Select all
Export citation of selected articles as:
13 pages, 3806 KB  
Article
Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types
by Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Taeho Lee, Yasin Ekinci and Jinho Ahn
Photonics 2025, 12(3), 266; https://doi.org/10.3390/photonics12030266 - 14 Mar 2025
Cited by 1 | Viewed by 4080
Abstract
This study investigates the differences in the lithographic impact of particles on the pellicle surface depending on the type of extreme ultraviolet (EUV) mask pattern. Using an EUV ptychography microscope, we analyzed how mask imaging performance is affected by locally obstructed mask diffraction [...] Read more.
This study investigates the differences in the lithographic impact of particles on the pellicle surface depending on the type of extreme ultraviolet (EUV) mask pattern. Using an EUV ptychography microscope, we analyzed how mask imaging performance is affected by locally obstructed mask diffraction caused by a 10 μm × 10 μm patterned tin particle intentionally fabricated on the pellicle surface. The resulting critical dimension variations were found to be approximately three times greater in line-and-space patterns than in contact hole patterns. Based on these findings, we recommend defining the critical size of particles according to the mask pattern type to optimize lithographic quality. Full article
Show Figures

Graphical abstract

Back to TopTop