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Keywords = conduction band edge energy profile

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13 pages, 2864 KiB  
Article
Band Bending and Trap Distribution along the Channel of Organic Field-Effect Transistors from Frequency-Resolved Scanning Photocurrent Microscopy
by Gion Kalemai, Nikolaos Vagenas, Athina Giannopoulou and Panagiotis Kounavis
Electronics 2022, 11(11), 1799; https://doi.org/10.3390/electronics11111799 - 6 Jun 2022
Cited by 1 | Viewed by 2180
Abstract
The scanning photocurrent microscopy (SPCM) method is applied to pentacene field-effect transistors (FETs). In this technique, a modulated laser beam is focused and scanned along the channel of the transistors. The resulting spatial photocurrent profile is attributed to extra free holes generated from [...] Read more.
The scanning photocurrent microscopy (SPCM) method is applied to pentacene field-effect transistors (FETs). In this technique, a modulated laser beam is focused and scanned along the channel of the transistors. The resulting spatial photocurrent profile is attributed to extra free holes generated from the dissociation of light-created excitons after their interaction with trapped holes. The trapped holes result from the local upward band bending in the accumulation layer depending on the applied voltages. Thus, the photocurrent profile along the conducting channel of the transistors reflects the pattern of the trapped holes and upward band bending under the various operating conditions of the transistor. Moreover, it is found here that the frequency-resolved SPCM (FR-SPCM) is related to the interaction of free holes via trapping and thermal release from active probed traps of the first pentacene monolayers in the accumulation layer. The active probed traps are selected by the modulation frequency of the laser beam so that the FR-SPCM can be applied as a spectroscopic technique to determine the energy distribution of the traps along the transistor channel. In addition, a crossover is found in the FR-SPCM spectra that signifies the transition from empty to partially empty probed trapping states near the corresponding trap quasi-Fermi level. From the frequency of this crossover, the energy gap from the quasi-Fermi Etp level to the corresponding local valence band edge Ev, which is bent up by the gate voltage, can be estimated. This allows us to spatially determine the magnitude of the band bending under different operation conditions along the channel of the organic transistors. Full article
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8 pages, 1829 KiB  
Article
Correlation between Optical Localization-State and Electrical Deep-Level State in In0.52Al0.48As/In0.53Ga0.47As Quantum Well Structure
by Il-Ho Ahn, Deuk Young Kim and Sejoon Lee
Nanomaterials 2021, 11(3), 585; https://doi.org/10.3390/nano11030585 - 26 Feb 2021
Cited by 4 | Viewed by 2486
Abstract
The peculiar correlationship between the optical localization-state and the electrical deep-level defect-state was observed in the In0.52Al0.48As/In0.53Ga0.47As quantum well structure that comprises two quantum-confined electron-states and two hole-subbands. The sample clearly exhibited the Fermi edge [...] Read more.
The peculiar correlationship between the optical localization-state and the electrical deep-level defect-state was observed in the In0.52Al0.48As/In0.53Ga0.47As quantum well structure that comprises two quantum-confined electron-states and two hole-subbands. The sample clearly exhibited the Fermi edge singularity (FES) peak in its photoluminescence spectrum at 10–300 K; and the FES peak was analyzed in terms of the phenomenological line shape model with key physical parameters such as the Fermi energy, the hole localization energy, and the band-to-band transition amplitude. Through the comprehensive studies on both the theoretical calculation and the experimental evaluation of the energy band profile, we found out that the localized state, which is separated above by ~0.07 eV from the first excited hole-subband, corresponds to the deep-level state, residing at the position of ~0.75 eV far below the conduction band (i.e., near the valence band edge). Full article
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10 pages, 2673 KiB  
Communication
Conduction Band Edge Energy Profile Probed by Hall Offset Voltage in InGaZnO Thin Films
by Hyo-Jun Joo, Dae-Hwan Kim, Hyun-Seok Cha and Sang-Hun Song
Micromachines 2020, 11(9), 822; https://doi.org/10.3390/mi11090822 - 30 Aug 2020
Cited by 1 | Viewed by 3005
Abstract
We measured and analyzed the Hall offset voltages in InGaZnO thin-film transistors. The Hall offset voltages were found to decrease monotonously as the electron densities increased. We attributed the magnitude of the offset voltage to the misalignment in the longitudinal distance between the [...] Read more.
We measured and analyzed the Hall offset voltages in InGaZnO thin-film transistors. The Hall offset voltages were found to decrease monotonously as the electron densities increased. We attributed the magnitude of the offset voltage to the misalignment in the longitudinal distance between the probing points and the electron density to Fermi energy of the two-dimensional electron system, which was verified by the coincidence of the Hall voltage with the perpendicular magnetic field in the tilted magnetic field. From these results, we deduced the combined conduction band edge energy profiles from the Hall offset voltages with the electron density variations for three samples with different threshold voltages. The extracted combined conduction band edge varied by a few tens of meV over a longitudinal distance of a few tenths of µm. This result is in good agreement with the value obtained from the analysis of percolation conduction. Full article
(This article belongs to the Special Issue Thin Film Transistors with Oxide Semiconductors)
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