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Keywords = Frank–van der Merwe growth

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13 pages, 3559 KiB  
Article
The Effects of Substrate Temperature on the Growth, Microstructural and Magnetic Properties of Gadolinium-Containing Films on Aluminum Nitride
by Craig A. Ekstrum, Ragavendran Venkatesan, Chito Kendrick, Moshe Einav, Paramasivam Sivaprakash, Jeyanthinath Mayandi, Sonachalam Arumugam and Joshua M. Pearce
Surfaces 2022, 5(2), 321-333; https://doi.org/10.3390/surfaces5020024 - 9 Jun 2022
Cited by 1 | Viewed by 3029
Abstract
To facilitate future novel devices incorporating rare earth metal films and III-V semiconductors on Si substrates, this study investigates the mechanisms of growth via molecular beam epitaxy of gadolinium (Gd) on aluminum nitride (AlN) by determining the impact of substrate temperature on microstructure. [...] Read more.
To facilitate future novel devices incorporating rare earth metal films and III-V semiconductors on Si substrates, this study investigates the mechanisms of growth via molecular beam epitaxy of gadolinium (Gd) on aluminum nitride (AlN) by determining the impact of substrate temperature on microstructure. The Gd films underwent extensive surface analysis via in situ reflective high energy electron diffraction (RHEED) and ex-situ SEM and AFM. Characterization of the surface features of rare earth metal films is important, as surface geometry has been shown to strongly impact magnetic properties. SEM and AFM imaging determined that Gd films grown on AlN (0001) from 80 °C to 400 °C transition from wetting, nodular films to island–trench growth mode to reduce in-plane lattice strain. XRD and Raman spectroscopy of the films revealed that they were primarily comprised of GdN, Gd and Gd2O3. The samples were also analyzed by a vibrating sample magnetometer (VSM) at room temperature. From the room temperature magnetic studies, the thick films showed superparamagnetic behavior, with samples grown between 240 °C and 270 °C showing high magnetic susceptibility. Increasing GdN (111) 2θ peak position and single-crystal growth modes correlated with increasing peak magnetization of the thin films, suggesting that lattice strain in single-crystal films was the primary driver of enhanced magnetic susceptibility. Full article
(This article belongs to the Collection Featured Articles for Surfaces)
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15 pages, 3648 KiB  
Article
Fluoropolymer Film Formation by Electron Activated Vacuum Deposition
by Kostyantyn Grytsenko, Viachaslau Ksianzou, Yurii Kolomzarov, Peter Lytvyn, Birgit Dietzel and Sigurd Schrader
Surfaces 2021, 4(1), 66-80; https://doi.org/10.3390/surfaces4010009 - 22 Feb 2021
Cited by 12 | Viewed by 4894
Abstract
Polytetrafluoroethylene (PTFE), polyhexafluoropropylene (PHFP) and polychlorotrifluoroethylene (PCTFE) were heated to their decomposition temperature in a high vacuum. The emitted fragments passed an electron cloud, condensed on a substrate and formed fluoropolymer film. Growth rate of PTFE and PHFP films increased up to a [...] Read more.
Polytetrafluoroethylene (PTFE), polyhexafluoropropylene (PHFP) and polychlorotrifluoroethylene (PCTFE) were heated to their decomposition temperature in a high vacuum. The emitted fragments passed an electron cloud, condensed on a substrate and formed fluoropolymer film. Growth rate of PTFE and PHFP films increased up to a factor five in the presence of the electron cloud. Mass spectrometry revealed changes in the mass spectra of fragments generated by thermal decomposition only and formed under electron activation. The observed changes were different for each fluoropolymer. Infrared spectroscopy (IRS) showed that the structure of the films was close to the structure of the bulk polymers. Atomic force microscopy (AFM) has revealed different morphologies of PTFE, PHFP and PCTFE films, suggesting a Volmer–Weber growth mechanism for PTFE and PHFP but a Frank-van der Merwe one for PCTFE. All films were smooth at nanoscale and transparent from ultraviolet to near-infrared region. Additional radio frequency (RF) plasma ignited in the emitted fragments at a low pressure increased mechanical characteristics of the films without losing their optical transparency and smoothness. Full article
(This article belongs to the Special Issue Thin Films at Surfaces)
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13 pages, 1799 KiB  
Article
Influence of Electron Beam Treatment of Co–Cr Alloy on the Growing Mechanism, Surface Topography, and Mechanical Properties of Deposited TiN/TiO2 Coatings
by Stefan Valkov, Stoyan Parshorov, Andreana Andreeva, Ruslan Bezdushnyi, Maria Nikolova, Dimitar Dechev, Nikolay Ivanov and Peter Petrov
Coatings 2019, 9(8), 513; https://doi.org/10.3390/coatings9080513 - 13 Aug 2019
Cited by 17 | Viewed by 4737
Abstract
This study examines the effect of electron beam treatment (EBT) of Co–Cr substrate on the film growth mechanism, mechanical properties, and surface topography of TiN/TiO2 coatings deposited by reactive magnetron sputtering. The obtained results and processes that occurred during the deposition are [...] Read more.
This study examines the effect of electron beam treatment (EBT) of Co–Cr substrate on the film growth mechanism, mechanical properties, and surface topography of TiN/TiO2 coatings deposited by reactive magnetron sputtering. The obtained results and processes that occurred during the deposition are discussed in the context of crystallographic principles, and special attention is paid to the crystallographic orientation and growth mechanism studied by X-ray diffraction (XRD). The mechanical properties were investigated by means of nanoindentation and wear tests. The surface topography was evaluated using atomic force microscopy (AFM). The results obtained in the present study showed that polycrystalline TiN and anatase TiO2 phases were present in all cases. Electron beam treatment of Co–Cr substrate tended to form a reorientation of the microvolumes from (111) to (200) of TiN, leading to a change in the growth mechanism from three-dimensional (Volmer–Weber) to layer-by-layer (Frank–van der Merwe). It was found that the electron beam treatment process did not significantly affect the thickness of the coatings and the deposition rate. The treatment process led to an increase in surface roughness. The higher surface roughness after the EBT process should be appropriate to support cell growth and adhesion on the surface of the deposited bilayer coating. It was demonstrated that EBT of the substrate caused a decrease in hardness of the deposited coatings from 10 to 5 GPa. The observed decrease in hardness was attributed to the change in the preferred crystallographic orientation and film growth mechanism. The hardness of the bilayer coating after the application of EBT of the Co–Cr substrate was much closer to that of human bones, which means that severe stress shielding effect could not be expected. The evaluated coefficient of friction (COF) exhibited significantly lower values in the case of EBT of the substrate compared to the untreated Co–Cr material. Full article
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