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Analysis of Oxide Capacitance Changes Based on the Formation–Annihilation of Conductive Filaments in a SiO2/Si-NCs/SiO2 Stack Layer-Based MIS-like Capacitor
 
 
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J. Compos. Sci. 2024, 8(12), 488; https://doi.org/10.3390/jcs8120488
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