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Journal: J. Manuf. Mater. Process., 2025
Volume: 9
Number: 42
42
Article: Plasma Dielectric Etching with C₄H₂F₆ Isomers of Low Global-Warming Potential
Authors: by Minsu Choi, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Jami Md Ehsanul Haque, Byeongyeop Choi, Seonghyun Seo, Sijun Kim, Shinjae You and Geun Young Yeom
Link: https://www.mdpi.com/2504-4494/9/2/42

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