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Open AccessArticle

Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization

1
Graduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, Japan
2
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi Tsukuba, Ibaraki 305-8565, Japan
*
Author to whom correspondence should be addressed.
Present Affiliation: Institute of Post-LED Photonics, Tokushima University, 2-1 Minami-Josanjima, Tokushima, Tokushima 770-8506, Japan.
Photonics 2019, 6(2), 62; https://doi.org/10.3390/photonics6020062
Received: 2 May 2019 / Revised: 18 May 2019 / Accepted: 28 May 2019 / Published: 3 June 2019
(This article belongs to the Special Issue Holographic Optical Memory and Related Technologies)
Random phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In the present study, we propose modified random phase masks with phase modulation elements exhibiting Gaussian profiles to suppress the spread of the recording spot and keep it in a narrow area, based on the reduction of the high-frequency components in a random phase pattern. We confirm the effectiveness of the proposed random phase mask using simulations of a computer-generated binary hologram. However, issues still remain in terms of the fabrication of random phase masks with Gaussian profiles. Therefore, we evaluate the feasibility of fabricating the proposed random phase mask using molecular diffusion under photopolymerization. The results confirm the feasibility of this approach over a relatively wide area for actual fabrication. View Full-Text
Keywords: holographic memory; random phase mask; photopolymer; molecular diffusion holographic memory; random phase mask; photopolymer; molecular diffusion
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Emoto, A.; Honda, J.; Suzuki, K.; Kimoto, T.; Fukuda, T. Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization. Photonics 2019, 6, 62.

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