Crystalline Flat Surface Recovered by High-Temperature Annealing after Laser Ablation
Abstract
:1. Introduction: High Intensity > TW/cm Crystal Processing
2. Samples and Methods
2.1. Sapphire
2.2. Laser Ablation Conditions
2.3. High-Temperature Annealing
3. Results and Discussion
3.1. Roughness Reduction of Ablated Sapphire Surfaces
3.2. Recovery of Crystalline Smooth Surface on Ablated Sapphire
3.3. HTA Treatment of Back-Side Ablated Al2O3
4. Conclusions and Outlook
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
Appendix A. HTA of Al2O3 in N2
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Smith, D.; Ng, S.H.; Tang, A.; Katkus, T.; Moraru, D.; Juodkazis, S. Crystalline Flat Surface Recovered by High-Temperature Annealing after Laser Ablation. Photonics 2023, 10, 594. https://doi.org/10.3390/photonics10050594
Smith D, Ng SH, Tang A, Katkus T, Moraru D, Juodkazis S. Crystalline Flat Surface Recovered by High-Temperature Annealing after Laser Ablation. Photonics. 2023; 10(5):594. https://doi.org/10.3390/photonics10050594
Chicago/Turabian StyleSmith, Daniel, Soon Hock Ng, Amanda Tang, Tomas Katkus, Daniel Moraru, and Saulius Juodkazis. 2023. "Crystalline Flat Surface Recovered by High-Temperature Annealing after Laser Ablation" Photonics 10, no. 5: 594. https://doi.org/10.3390/photonics10050594