Li, B.; Rahaman, I.; Ellis, H.D.; Fu, H.; Zhao, Y.; Cai, Y.; Zhang, B.; Fu, K.
Plasma Treatment Technologies for GaN Electronics. Electronics 2024, 13, 4343.
https://doi.org/10.3390/electronics13224343
AMA Style
Li B, Rahaman I, Ellis HD, Fu H, Zhao Y, Cai Y, Zhang B, Fu K.
Plasma Treatment Technologies for GaN Electronics. Electronics. 2024; 13(22):4343.
https://doi.org/10.3390/electronics13224343
Chicago/Turabian Style
Li, Botong, Imteaz Rahaman, Hunter D. Ellis, Houqiang Fu, Yuji Zhao, Yong Cai, Baoshun Zhang, and Kai Fu.
2024. "Plasma Treatment Technologies for GaN Electronics" Electronics 13, no. 22: 4343.
https://doi.org/10.3390/electronics13224343
APA Style
Li, B., Rahaman, I., Ellis, H. D., Fu, H., Zhao, Y., Cai, Y., Zhang, B., & Fu, K.
(2024). Plasma Treatment Technologies for GaN Electronics. Electronics, 13(22), 4343.
https://doi.org/10.3390/electronics13224343