Dai, Y.; Wang, S.; Shao, C.; Zhang, H.; Jia, F.
Geometry-Aware Enhanced Mutual-Supervised Point Elimination with Overlapping Mask Contrastive Learning for Partitial Point Cloud Registration. Electronics 2024, 13, 4074.
https://doi.org/10.3390/electronics13204074
AMA Style
Dai Y, Wang S, Shao C, Zhang H, Jia F.
Geometry-Aware Enhanced Mutual-Supervised Point Elimination with Overlapping Mask Contrastive Learning for Partitial Point Cloud Registration. Electronics. 2024; 13(20):4074.
https://doi.org/10.3390/electronics13204074
Chicago/Turabian Style
Dai, Yue, Shuilin Wang, Chunfeng Shao, Heng Zhang, and Fucang Jia.
2024. "Geometry-Aware Enhanced Mutual-Supervised Point Elimination with Overlapping Mask Contrastive Learning for Partitial Point Cloud Registration" Electronics 13, no. 20: 4074.
https://doi.org/10.3390/electronics13204074
APA Style
Dai, Y., Wang, S., Shao, C., Zhang, H., & Jia, F.
(2024). Geometry-Aware Enhanced Mutual-Supervised Point Elimination with Overlapping Mask Contrastive Learning for Partitial Point Cloud Registration. Electronics, 13(20), 4074.
https://doi.org/10.3390/electronics13204074