Wang, H.; Qi, J.; Xie, X.; Liu, Z.; Wu, W.; Lee, C.
Optimal Process Design for Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Capacitors: Toward Low-Power Devices with Enhanced Ferroelectric Performance. Electronics 2024, 13, 2895.
https://doi.org/10.3390/electronics13152895
AMA Style
Wang H, Qi J, Xie X, Liu Z, Wu W, Lee C.
Optimal Process Design for Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Capacitors: Toward Low-Power Devices with Enhanced Ferroelectric Performance. Electronics. 2024; 13(15):2895.
https://doi.org/10.3390/electronics13152895
Chicago/Turabian Style
Wang, Hui, Jiabin Qi, Xinyu Xie, Zongfang Liu, Wenhao Wu, and Choonghyun Lee.
2024. "Optimal Process Design for Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Capacitors: Toward Low-Power Devices with Enhanced Ferroelectric Performance" Electronics 13, no. 15: 2895.
https://doi.org/10.3390/electronics13152895
APA Style
Wang, H., Qi, J., Xie, X., Liu, Z., Wu, W., & Lee, C.
(2024). Optimal Process Design for Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Capacitors: Toward Low-Power Devices with Enhanced Ferroelectric Performance. Electronics, 13(15), 2895.
https://doi.org/10.3390/electronics13152895