Effect of Deposition Pressure on the Microstructure and Optical Band Gap of Molybdenum Disulfide Films Prepared by Magnetron Sputtering
Abstract
:1. Introduction
2. Experimental Details
2.1. Preparation of MoS2 Films
2.2. Characterization of MoS2 Films
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
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Crystal Parameter | Pressure | |||
---|---|---|---|---|
0.8 Pa | 1.0 Pa | 1.2 Pa | 1.4 Pa | |
a (nm) | 3.851 | 3.828 | 3.829 | 3.828 |
d (nm) | 1.362 | 1.354 | 1.354 | 1.353 |
D (nm) | 22.804 | 30.353 | 28.782 | 31.499 |
Sample Parameter | Pressure | |||
---|---|---|---|---|
0.8 Pa | 1.0 Pa | 1.2 Pa | 1.4 Pa | |
Roughness (nm) | 16.83 | 5.96 | 7.21 | 4.08 |
Thickness (nm) | 148 | 137 | 128 | 153 |
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Gong, C.; Xiao, J.; Zhu, L.; Wang, Z.; Ma, S. Effect of Deposition Pressure on the Microstructure and Optical Band Gap of Molybdenum Disulfide Films Prepared by Magnetron Sputtering. Coatings 2019, 9, 570. https://doi.org/10.3390/coatings9090570
Gong C, Xiao J, Zhu L, Wang Z, Ma S. Effect of Deposition Pressure on the Microstructure and Optical Band Gap of Molybdenum Disulfide Films Prepared by Magnetron Sputtering. Coatings. 2019; 9(9):570. https://doi.org/10.3390/coatings9090570
Chicago/Turabian StyleGong, Chenyang, Jianrong Xiao, Liwen Zhu, Zhiyong Wang, and Songshan Ma. 2019. "Effect of Deposition Pressure on the Microstructure and Optical Band Gap of Molybdenum Disulfide Films Prepared by Magnetron Sputtering" Coatings 9, no. 9: 570. https://doi.org/10.3390/coatings9090570