Structure of Highly Porous Silicon Dioxide Thin Film: Results of Atomistic Simulation
Abstract
:1. Introduction
2. Method
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
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Subst. Dimens. | 10 nm × 30 nm | 20 nm × 60 nm | ||||||
---|---|---|---|---|---|---|---|---|
n | 100 | 200 | 300 | 400 | 500 | 100 | 500 | 1000 |
ρ | 1.31 | 1.34 | 1.39 | 1.26 | 1.44 | 1.33 | 1.32 | 1.35 |
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Grigoriev, F.V.; Sulimov, V.B.; Tikhonravov, A.V. Structure of Highly Porous Silicon Dioxide Thin Film: Results of Atomistic Simulation. Coatings 2019, 9, 568. https://doi.org/10.3390/coatings9090568
Grigoriev FV, Sulimov VB, Tikhonravov AV. Structure of Highly Porous Silicon Dioxide Thin Film: Results of Atomistic Simulation. Coatings. 2019; 9(9):568. https://doi.org/10.3390/coatings9090568
Chicago/Turabian StyleGrigoriev, F.V., V.B. Sulimov, and A.V. Tikhonravov. 2019. "Structure of Highly Porous Silicon Dioxide Thin Film: Results of Atomistic Simulation" Coatings 9, no. 9: 568. https://doi.org/10.3390/coatings9090568