Piirsoo, H.-M.; Jõgiaas, T.; Ritslaid, P.; Kukli, K.; Tamm, A.
Influence to Hardness of Alternating Sequence of Atomic Layer Deposited Harder Alumina and Softer Tantala Nanolaminates. Coatings 2022, 12, 404.
https://doi.org/10.3390/coatings12030404
AMA Style
Piirsoo H-M, Jõgiaas T, Ritslaid P, Kukli K, Tamm A.
Influence to Hardness of Alternating Sequence of Atomic Layer Deposited Harder Alumina and Softer Tantala Nanolaminates. Coatings. 2022; 12(3):404.
https://doi.org/10.3390/coatings12030404
Chicago/Turabian Style
Piirsoo, Helle-Mai, Taivo Jõgiaas, Peeter Ritslaid, Kaupo Kukli, and Aile Tamm.
2022. "Influence to Hardness of Alternating Sequence of Atomic Layer Deposited Harder Alumina and Softer Tantala Nanolaminates" Coatings 12, no. 3: 404.
https://doi.org/10.3390/coatings12030404
APA Style
Piirsoo, H.-M., Jõgiaas, T., Ritslaid, P., Kukli, K., & Tamm, A.
(2022). Influence to Hardness of Alternating Sequence of Atomic Layer Deposited Harder Alumina and Softer Tantala Nanolaminates. Coatings, 12(3), 404.
https://doi.org/10.3390/coatings12030404