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Article

Low-Temperature Fabrication of High-Performance and Stable GZO/Ag/GZO Multilayer Structures for Transparent Electrode Applications

by
Akmedov K. Akhmedov
1,
Aslan Kh. Abduev
1,
Vladimir M. Kanevsky
2,
Arsen E. Muslimov
2 and
Abil Sh. Asvarov
1,2,*
1
Institute of Physics, Dagestan Federal Research Center, Russian Academy of Sciences, 367015 Makhachkala, Russia
2
Shubnikov Institute of Crystallography, Federal Scientific Research Center Crystallography and Photonics, Russian Academy of Sciences, 119333 Moscow, Russia
*
Author to whom correspondence should be addressed.
Coatings 2020, 10(3), 269; https://doi.org/10.3390/coatings10030269
Submission received: 13 February 2020 / Revised: 10 March 2020 / Accepted: 12 March 2020 / Published: 13 March 2020
(This article belongs to the Special Issue Optical Thin Films and Structures: Design and Advanced Applications)

Abstract

Presently, research and development of indium-free stable highly transparent conductive (TC) materials is of paramount importance for the blooming world of information display systems and solar energy conversion. Development of devices based on flexible organic substrates further narrows the choice of possible TC materials due to the need for lower deposition and process temperatures. In our work, the structural, electrical, and optical performances of Ga-doped ZnO/Ag/Ga-doped ZnO (GZO/Ag/GZO) multilayered structures deposited on glass substrates by direct current (DC) magnetron sputtering in a pure Ar medium without any purposeful substrate heating have been investigated. The highest figure of merit achieved was 5.15 × 10−2 Ω−1 for the symmetric GZO/Ag/GZO multilayer, featuring GZO and Ag thicknesses of 40 and 10 nm, respectively, while the average optical transmittance was over 81% in the visible range of wavelengths and the resistivity was 2.2 × 10−5 Ω·cm. Additionally, the good durability of the performances of the multilayer structures was demonstrated by their testing in the context of long-term storage (over 500 days) in standard environmental conditions.
Keywords: multilayer; ZnO; Ag; TCO; transmittance; structure; resistance multilayer; ZnO; Ag; TCO; transmittance; structure; resistance

Share and Cite

MDPI and ACS Style

Akhmedov, A.K.; Abduev, A.K.; Kanevsky, V.M.; Muslimov, A.E.; Asvarov, A.S. Low-Temperature Fabrication of High-Performance and Stable GZO/Ag/GZO Multilayer Structures for Transparent Electrode Applications. Coatings 2020, 10, 269. https://doi.org/10.3390/coatings10030269

AMA Style

Akhmedov AK, Abduev AK, Kanevsky VM, Muslimov AE, Asvarov AS. Low-Temperature Fabrication of High-Performance and Stable GZO/Ag/GZO Multilayer Structures for Transparent Electrode Applications. Coatings. 2020; 10(3):269. https://doi.org/10.3390/coatings10030269

Chicago/Turabian Style

Akhmedov, Akmedov K., Aslan Kh. Abduev, Vladimir M. Kanevsky, Arsen E. Muslimov, and Abil Sh. Asvarov. 2020. "Low-Temperature Fabrication of High-Performance and Stable GZO/Ag/GZO Multilayer Structures for Transparent Electrode Applications" Coatings 10, no. 3: 269. https://doi.org/10.3390/coatings10030269

APA Style

Akhmedov, A. K., Abduev, A. K., Kanevsky, V. M., Muslimov, A. E., & Asvarov, A. S. (2020). Low-Temperature Fabrication of High-Performance and Stable GZO/Ag/GZO Multilayer Structures for Transparent Electrode Applications. Coatings, 10(3), 269. https://doi.org/10.3390/coatings10030269

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