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Open AccessArticle

Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy

1
Institute of Electronic Materials and Technology, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
2
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
*
Author to whom correspondence should be addressed.
Nanomaterials 2017, 7(11), 359; https://doi.org/10.3390/nano7110359
Received: 31 August 2017 / Revised: 18 September 2017 / Accepted: 25 September 2017 / Published: 31 October 2017
(This article belongs to the Special Issue ZnO and TiO2 Based Nanostructures)
Ti-Ni-Si-O nanostructures were successfully prepared on Ti-1Ni-5Si alloy foils via electrochemical anodization in ethylene glycol/glycerol solutions containing a small amount of water. The Ti-Ni-Si-O nanostructures were characterized by field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), and diffuse reflectance absorption spectra. Furthermore, the photoelectrochemical water splitting properties of the Ti-Ni-Si-O nanostructure films were investigated. It was found that, after anodization, three different kinds of Ti-Ni-Si-O nanostructures formed in the α-Ti phase region, Ti2Ni phase region, and Ti5Si3 phase region of the alloy surface. Both the anatase and rutile phases of Ti-Ni-Si-O oxide appeared after annealing at 500 °C for 2 h. The photocurrent density obtained from the Ti-Ni-Si-O nanostructure photoanodes was 0.45 mA/cm2 at 0 V (vs. Ag/AgCl) in 1 M KOH solution. The above findings make it feasible to further explore excellent photoelectrochemical properties of the nanostructure-modified surface of Ti-Ni-Si ternary alloys. View Full-Text
Keywords: anodization; TiO2 nanostructure; doping; photoelectrochemical water splitting anodization; TiO2 nanostructure; doping; photoelectrochemical water splitting
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MDPI and ACS Style

Li, T.; Ding, D.; Dong, Z.; Ning, C. Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy. Nanomaterials 2017, 7, 359. https://doi.org/10.3390/nano7110359

AMA Style

Li T, Ding D, Dong Z, Ning C. Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy. Nanomaterials. 2017; 7(11):359. https://doi.org/10.3390/nano7110359

Chicago/Turabian Style

Li, Ting; Ding, Dongyan; Dong, Zhenbiao; Ning, Congqin. 2017. "Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy" Nanomaterials 7, no. 11: 359. https://doi.org/10.3390/nano7110359

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