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Journal: Nanomaterials, 2024
Volume: 14
Number: 466
Article:
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors
Authors:
by
Jeong-Hyeon Na, Jun-Hyeong Park, Won Park, Junhao Feng, Jun-Su Eun, Jinuk Lee, Sin-Hyung Lee, Jaewon Jang, In Man Kang, Do-Kyung Kim and Jin-Hyuk Bae
Link:
https://www.mdpi.com/2079-4991/14/5/466
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