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Journal: Nanomaterials, 2024
Volume: 14
Number: 831

Article: Setting Plasma Immersion Ion Implantation of Ar+ Parameters towards Electroforming-Free and Self-Compliance HfO2-Based Memristive Structures
Authors: by Olga Permiakova, Sergey Pankratov, Alexandr Isaev, Andrew Miakonkikh, Yuri Chesnokov, Andrey Lomov and Alexander Rogozhin
Link: https://www.mdpi.com/2079-4991/14/10/831

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