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Journal: NanomaterialsVolume: 13Number: 2104
Article: Comprehensive Investigation of Constant Voltage Stress Time-Dependent Breakdown and Cycle-to-Breakdown Reliability in Y-Doped and Si-Doped HfO2 Metal-Ferroelectric-Metal Memory
  • Authors:
  • Ting-Yu Chang1,
  • Kuan-Chi Wang1 and
  • Hsien-Yang Liu2
  • et al.
Link: https://www.mdpi.com/2079-4991/13/14/2104

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