Zhao, B.; Yan, Y.; Bi, J.; Xu, G.; Xu, Y.; Yang, X.; Fan, L.; Liu, M.
Improved Ferroelectric Properties in Hf0.5Zr0.5O2 Thin Films by Microwave Annealing. Nanomaterials 2022, 12, 3001.
https://doi.org/10.3390/nano12173001
AMA Style
Zhao B, Yan Y, Bi J, Xu G, Xu Y, Yang X, Fan L, Liu M.
Improved Ferroelectric Properties in Hf0.5Zr0.5O2 Thin Films by Microwave Annealing. Nanomaterials. 2022; 12(17):3001.
https://doi.org/10.3390/nano12173001
Chicago/Turabian Style
Zhao, Biyao, Yunting Yan, Jinshun Bi, Gaobo Xu, Yannan Xu, Xueqin Yang, Linjie Fan, and Mengxin Liu.
2022. "Improved Ferroelectric Properties in Hf0.5Zr0.5O2 Thin Films by Microwave Annealing" Nanomaterials 12, no. 17: 3001.
https://doi.org/10.3390/nano12173001
APA Style
Zhao, B., Yan, Y., Bi, J., Xu, G., Xu, Y., Yang, X., Fan, L., & Liu, M.
(2022). Improved Ferroelectric Properties in Hf0.5Zr0.5O2 Thin Films by Microwave Annealing. Nanomaterials, 12(17), 3001.
https://doi.org/10.3390/nano12173001