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Article

Fabrication and Characterization of Transparent and Scratch-Proof Yttrium/Sialon Thin Films

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Physics Department, King Fahd University of Petroleum & Minerals, Dhahran 31261, Saudi Arabia
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Center of Excellence in Nanotechnology, King Fahd University of Petroleum & Minerals, Dhahran 31261, Saudi Arabia
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Mechanical Engineering Department, King Fahd University of Petroleum & Minerals, Dhahran 31261, Saudi Arabia
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Center for Engineering Research, Research Institute, King Fahd University of Petroleum & Minerals, Dhahran 31261, Saudi Arabia
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Author to whom correspondence should be addressed.
Nanomaterials 2020, 10(11), 2283; https://doi.org/10.3390/nano10112283
Received: 19 October 2020 / Revised: 10 November 2020 / Accepted: 11 November 2020 / Published: 18 November 2020
(This article belongs to the Special Issue Pulsed Laser Deposited Nanostructures)
Transparent and amorphous yttrium (Y)/Sialon thin films were successfully fabricated using pulsed laser deposition (PLD). The thin films were fabricated in three steps. First, Y/Sialon target was synthesized using spark plasma sintering technique at 1500 °C in an inert atmosphere. Second, the surface of the fabricated target was cleaned by grinding and polishing to remove any contamination, such as graphite and characterized. Finally, thin films were grown using PLD in an inert atmosphere at various substrate temperatures (RT to 500 °C). While the X-ray diffractometer (XRD) analysis revealed that the Y/Sialon target has β phase, the XRD of the fabricated films showed no diffraction peaks and thus confirming the amorphous nature of fabricated thin films. XRD analysis displayed that the fabricated thin films were amorphous while the transparency, measured by UV-vis spectroscopy, of the films, decreased with increasing substrate temperature, which was attributed to a change in film thickness with deposition temperature. X-ray photoelectron spectroscopy (XPS) results suggested that the synthesized Y/Sialon thin films are nearly homogenous and contained all target’s elements. A scratch test revealed that both 300 and 500 °C coatings possess the tough and robust nature of the film, which can resist much harsh loads and shocks. These results pave the way to fabricate different Sialon doped materials for numerous applications. View Full-Text
Keywords: yttrium; sialon; thin films; ultra-hard; pulsed laser deposition yttrium; sialon; thin films; ultra-hard; pulsed laser deposition
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MDPI and ACS Style

Mohamedkhair, A.K.; Hakeem, A.S.; Drmosh, Q.A.; Mohammed, A.S.; Baig, M.M.A.; Ul-Hamid, A.; Gondal, M.A.; Yamani, Z.H. Fabrication and Characterization of Transparent and Scratch-Proof Yttrium/Sialon Thin Films. Nanomaterials 2020, 10, 2283. https://doi.org/10.3390/nano10112283

AMA Style

Mohamedkhair AK, Hakeem AS, Drmosh QA, Mohammed AS, Baig MMA, Ul-Hamid A, Gondal MA, Yamani ZH. Fabrication and Characterization of Transparent and Scratch-Proof Yttrium/Sialon Thin Films. Nanomaterials. 2020; 10(11):2283. https://doi.org/10.3390/nano10112283

Chicago/Turabian Style

Mohamedkhair, Amar K., Abbas S. Hakeem, Qasem A. Drmosh, Abdul S. Mohammed, Mirza M.A. Baig, Anwar Ul-Hamid, Mohammed A. Gondal, and Zain H. Yamani. 2020. "Fabrication and Characterization of Transparent and Scratch-Proof Yttrium/Sialon Thin Films" Nanomaterials 10, no. 11: 2283. https://doi.org/10.3390/nano10112283

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