Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation
1
Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8556, Japan
2
Department of Chemical Engineering, Virginia Tech, Blacksburg, VA 24061, USA
3
College of Chemical Engineering, Fuzhou University, Fuzhou 350116, China
*
Author to whom correspondence should be addressed.
†
Current address: Department of Applied Chemistry, Faculty of Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Membranes 2019, 9(10), 123; https://doi.org/10.3390/membranes9100123
Received: 1 August 2019 / Revised: 6 September 2019 / Accepted: 12 September 2019 / Published: 20 September 2019
(This article belongs to the Special Issue Preparation, Characterization and Application of Silica-Based Membranes)
Gas separation membranes were fabricated with varying trimethylmethoxysilane (TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at 650 °C and atmospheric pressure. The membrane had a high H2 permeance of 8.3 × 10−7 mol m−2 s−1 Pa−1 with H2/CH4 selectivity of 140 and H2/C2H6 selectivity of 180 at 300 °C. Fourier transform infrared (FTIR) measurements indicated existence of methyl groups at high preparation temperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derived membranes than of a pure TEOS-derived membrane. Temperature-dependence measurements of the permeance of various gas species were used to establish a permeation mechanism. It was found that smaller species (He, H2, and Ne) followed a solid-state diffusion model while larger species (N2, CO2, and CH4) followed a gas translational diffusion model.
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Keywords:
silica-based membrane; hydrogen separation; CVD; pore size control; trimethylmethoxisilane; separation mechanism
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited
MDPI and ACS Style
Mise, Y.; Ahn, S.-J.; Takagaki, A.; Kikuchi, R.; Oyama, S.T. Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation. Membranes 2019, 9, 123. https://doi.org/10.3390/membranes9100123
AMA Style
Mise Y, Ahn S-J, Takagaki A, Kikuchi R, Oyama ST. Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation. Membranes. 2019; 9(10):123. https://doi.org/10.3390/membranes9100123
Chicago/Turabian StyleMise, Yoshihiro; Ahn, So-Jin; Takagaki, Atsushi; Kikuchi, Ryuji; Oyama, Shigeo T. 2019. "Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation" Membranes 9, no. 10: 123. https://doi.org/10.3390/membranes9100123
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