Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation
1
Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8556, Japan
2
Department of Chemical Engineering, Virginia Tech, Blacksburg, VA 24061, USA
3
College of Chemical Engineering, Fuzhou University, Fuzhou 350116, China
*
Author to whom correspondence should be addressed.
†
Current address: Department of Applied Chemistry, Faculty of Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Membranes 2019, 9(10), 123; https://doi.org/10.3390/membranes9100123
Received: 1 August 2019 / Revised: 6 September 2019 / Accepted: 12 September 2019 / Published: 20 September 2019
(This article belongs to the Special Issue Preparation, Characterization and Application of Silica-Based Membranes)
Gas separation membranes were fabricated with varying trimethylmethoxysilane (TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at 650 °C and atmospheric pressure. The membrane had a high H2 permeance of 8.3 × 10−7 mol m−2 s−1 Pa−1 with H2/CH4 selectivity of 140 and H2/C2H6 selectivity of 180 at 300 °C. Fourier transform infrared (FTIR) measurements indicated existence of methyl groups at high preparation temperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derived membranes than of a pure TEOS-derived membrane. Temperature-dependence measurements of the permeance of various gas species were used to establish a permeation mechanism. It was found that smaller species (He, H2, and Ne) followed a solid-state diffusion model while larger species (N2, CO2, and CH4) followed a gas translational diffusion model.
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Keywords:
silica-based membrane; hydrogen separation; CVD; pore size control; trimethylmethoxisilane; separation mechanism
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MDPI and ACS Style
Mise, Y.; Ahn, S.-J.; Takagaki, A.; Kikuchi, R.; Oyama, S.T. Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation. Membranes 2019, 9, 123. https://doi.org/10.3390/membranes9100123
AMA Style
Mise Y, Ahn S-J, Takagaki A, Kikuchi R, Oyama ST. Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation. Membranes. 2019; 9(10):123. https://doi.org/10.3390/membranes9100123
Chicago/Turabian StyleMise, Yoshihiro; Ahn, So-Jin; Takagaki, Atsushi; Kikuchi, Ryuji; Oyama, Shigeo T. 2019. "Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation" Membranes 9, no. 10: 123. https://doi.org/10.3390/membranes9100123
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