Advanced Parameter Optimization for Laser Engraving Machines via Genetic Algorithms
Abstract
1. Introduction
- Novel framework: We present a novel multi-objective optimization framework that combines CMYK-based image features with evolutionary algorithms to automatically optimize the parameters of laser engraving.
- Algorithmic comparison: We conduct a thorough comparison between three popular MOEAs (NSGA-II, SPEA2, and MOEA/D) in terms of their trade-offs between convergence speed, solution diversity, and robustness.
- Experimental validation: We conduct experiments on anodized aluminum 6061 to validate the feasibility and effectiveness of the proposed framework under controlled laser engraving conditions.
- Industrial relevance: We demonstrate quantitatively that the convenience of both material efficiency and color consistency is increased over manual tuning and single-objective optimization, thus showing the potential for integrating our approach into smart manufacturing systems.
2. Related Works
3. Methods
3.1. Dataset and Feature Extraction
- Image Acquisition: Engraved workpieces were imaged using a high-resolution industrial camera under consistent illumination. Images were cropped to the engraved region of interest.
- Color Representation: RGB images were converted to CMYK values, which better describe perceived engraving appearance. Average CMYK values were extracted from each workpiece.
- Color Difference Metric: To quantify perceptual differences, the average color difference was computed between targets and actual engraving outputs. This ensures that optimization reflects not only machine settings but also human-perceived quality.
3.2. Multi-Objective Optimization Formulation
- : Color difference, CMYK-based average color difference (minimize).
- : Processing time, approximated by path length/scanning speed (minimize).
- : Energy consumption, proportional to P × time (minimize).
3.3. Algorithmic Implementations
| Algorithm 1 Proposed MOEA-based optimization framework for laser engraving | ||
| Require: Engraved workpiece images with CMYK features and targets | ||
| Ensure: Pareto-optimal parameter set | ||
| 1: | Initialize population of candidate solutions, each as | |
| 2: | for each individual do | |
| 3: | ▹ Average Color difference (minimize) | |
| 4: | ▹ Processing time (minimize) | |
| 5: | ▹ Energy consumption (minimize) | |
| 6: | end for | |
| 7: | while termination criteria not met do | |
| 8: | Select parents based on MOEA type (NSGA-II / SPEA2 / MOEA/D) | |
| 9: | Apply crossover and mutation to generate offspring | |
| 10: | Clip offspring values into valid ranges | |
| with step 10 | ||
| with step 100 | ||
| with step 10 | ||
| 11: | Evaluate offspring objectives | |
| 12: | Update population and archive according to the selected MOEA | |
| 13: | end while | |
| 14: | return Pareto front of optimized | |
3.3.1. NSGA-II
3.3.2. SPEA2
3.3.3. MOEA/D
3.4. Algorithmic Comparison and Complexity
- NSGA-II: Complexity O(). Strong diversity but slower for large populations.
- SPEA2: Complexity O(). Balanced convergence and diversity but requires archive management.
- MOEA/D: Complexity O(NM). Scalable and efficient in high dimensions but may lose diversity if weight vectors are poorly chosen.
4. Experiments
4.1. Hardware Setup
- SPI 30W fiber laser, 1064 nm wavelength.
- SINO-GALVO galvanometer scanner.
- 150 × 150 mm focusing lens.
- Black anodized aluminum 6061 plates as workpieces.
- CPU: Intel Core i5-10300H @ 2.50 GHz.
- RAM: 16 GB DDR4.
- GPU: NVIDIA GeForce RTX 2060, 6 GB VRAM.
- Operating System: Windows 10, 64-bit.
- Programming Environment: Python 3.10 with DEAP 1.4, NumPy 1.24.4, and Matplotlib 3.7.5.
4.2. Parameter Ranges
4.3. MOEA Configuration Parameters
4.4. Flows
4.5. Data Preprocessing
4.6. Experimental Results
5. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
Abbreviations
| MOEA | Multi-Objective Evolutionary Algorithm |
| MOEA/D | Multi-Objective Evolutionary Algorithm Based on Decomposition |
| NSGA-II | Non-Dominated Sorting Genetic Algorithm II |
| SPEA2 | Strength Pareto Evolutionary Algorithm 2 |
| CMYK | Cyan, Magenta, Yellow, Key (Black) |
| CMYK-based Average Color Difference | |
| P | Laser Power |
| Scanning Speed | |
| Laser Frequency | |
| PS | Population Size |
| OS | Offspring Size |
| GEN | Total Number of Generations |
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| Reference | Material | Method | Objectives | Limitation |
|---|---|---|---|---|
| [6] | Various | Experimental optimization | Engraving depth | Limited scalability |
| [7] | Mixed | Grey relational analysis | Multi-parameter engraving | Empirical only, not automated |
| [9] | Steel | Statistical modeling | Roughness | No automated optimization |
| [10] | Stainless steel | Single-objective optimization | Cutting efficiency | Ignores multi-objective trade-offs |
| [11] | General | MOEA | Multi-objective fronts | Not applied to laser engraving |
| [12] | General | MOEA | Convergence/diversity balance | Not validated for engraving |
| [13] | General | MOEA | Decomposition-based optimization | Rarely used in machining |
| Our Work | Anodized Aluminum 6061 | MOEA (NSGA-II, SPEA2, and MOEA/D) | Color consistency, efficiency, and parameter tuning | First systematic comparison in engraving |
| Speed (mm/s) | Power (%) | Frequency (kHz) | |
|---|---|---|---|
| Minimum | 100 | 10 | 10 |
| Maximum | 3000 | 100 | 150 |
| Param | PS | OS | GEN | CXPB/CX | MUTPB/MUT |
|---|---|---|---|---|---|
| Value | 100 | 200 | 50 | 0.7/20.0 | 0.2/20.0 |
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Lee, C.-Y.; Wang, C.-M.; Jian, J.-X. Advanced Parameter Optimization for Laser Engraving Machines via Genetic Algorithms. Appl. Sci. 2025, 15, 11925. https://doi.org/10.3390/app152211925
Lee C-Y, Wang C-M, Jian J-X. Advanced Parameter Optimization for Laser Engraving Machines via Genetic Algorithms. Applied Sciences. 2025; 15(22):11925. https://doi.org/10.3390/app152211925
Chicago/Turabian StyleLee, Chen-Yu, Chuin-Mu Wang, and Jia-Xian Jian. 2025. "Advanced Parameter Optimization for Laser Engraving Machines via Genetic Algorithms" Applied Sciences 15, no. 22: 11925. https://doi.org/10.3390/app152211925
APA StyleLee, C.-Y., Wang, C.-M., & Jian, J.-X. (2025). Advanced Parameter Optimization for Laser Engraving Machines via Genetic Algorithms. Applied Sciences, 15(22), 11925. https://doi.org/10.3390/app152211925
