3.1. Simulation Results
The simulated reflection coefficients for normal incidence, showing both the frequency dependence and the variation with polarization angle (φ) from 0° to 180°, are shown in
Figure 2.
It is clear from
Figure 2 that the metasurface of the unit cell in
Figure 1 (for both models) exhibits a polarization-dependent characteristic when the polarization is varied from 0° to 180°, especially around 5 GHz where the reflection becomes small (absorption becomes large). As shown in
Figure 2, the minimum reflection coefficient occurs at 5.122 GHz (absorption > 98%) at
= 0° and 5.144 GHz (absorption > 99%) at
= 10°, respectively, based on the two models. These shifts in resonant frequency are mainly caused by changes in the resistor position and structure. The frequency variations in S11 as shown in
Figure 2 are mainly due to the resonant behavior of the unit cell, where the interaction between the incident electric field and the lumped resistor varies with polarization angle. Changes in polarization affect the current distribution and impedance matching, leading to variations in the reflection coefficient across frequencies.
The voltage across the lumped resistor is obtained directly from the CST simulation results. This voltage represents the peak (not root mean square, or RMS) amplitude across the resistor. Based on the simulated voltage, the total power harvested across the load R can be calculated using Equation (1), which is as follows:
where
V is the voltage amplitude (not the RMS value) of the lumped resistor and
is the total energy harvested on the lumped resistor
R. The lumped resistor was inserted in the unit cell. Choosing the right lumped resistor value can increase the absorption value through impedance matching with free space. The energy absorbed by our structure cannot be completely absorbed by the lumped resistor since some of it is dissipated by dielectric loss in the substrate. In this model, the energy dissipated by dielectric loss is 2.3%. This dielectric loss is frequency-dependent, primarily characterized by the loss tangent (tan δ) which arises from polarization relaxation under time-varying electric fields. Effective metasurface design can minimize energy dissipation during electromagnetic interactions [
31].
Figure 3 shows the voltage in each model for normal incidence. Maximum voltage occurs at polarization angles equal to
= 0° and 10° for Models A and B, respectively. The polarization angle where the energy absorbed by the lumped resistor is minimum is shown in
Figure 3 by the appearance of a minimum voltage that does not depend on frequency. We call this condition the dip phenomenon, which is clearly visible when the voltage across the lumped resistor changes with changing polarization angle, which is a polarization-dependent characteristic. For all models a voltage dip was always found at a specific angle. In the first model, the dip appears at a polarization angle of 90°. In the second model, the dip appears at a polarization angle of 100°. For a geometrical structure the dip phenomenon occurs when the position of the lumped resistor from the center of the patch has an angle of 90° to the direction of the electric field, as shown in
Figure 3. It can be analyzed that when the electric field is perpendicular to the line connecting the lumped resistor position and the patch center no effective voltage is developed along that direction on the patch. As a result, no voltage difference is established between the patch and the ground and the lumped resistor does not absorb any current. This misalignment prevents energy from being transferred into the resistive load, leading to negligible power absorption under this condition.
To provide more physical insight into the unit cell of the proposed metasurface, an analysis of the surface current distribution is presented in
Figure 4 and
Figure 5. In
Figure 4, this analysis is conducted at the frequency where power absorption is at its maximum as the polarization angle is varied. The condition of the surface current distribution on the back-side of the unit cell when the electric field is aligned with the position of the lumped resistor from the center of the patch and the voltage on the lumped resistor is at its maximum is shown in
Figure 4a,b for Model A at 5.114 GHz (
= 0°) and Model B at 5.136 GHz (φ = 10°), respectively. For all models, the current always passes through the circle in the middle (via) with different intensity between the incoming and outgoing sides. The current flow is observed to converge into the via from one side with higher surface current density and to diverge from the other side with lower density, as shown in
Figure 4. This imbalance in current density suggests that a portion of the induced surface current is diverted through the via and dissipated by the lumped resistor. This condition occurs when the incident electric field has a component aligned with the direction of the lumped resistor position from the center of the patch, thereby inducing an effective voltage along that direction on the patch. The via, which is shifted from the center of the patch, breaks the geometric symmetry of the unit cell. This asymmetry results in an unbalanced surface current distribution, which enhances the coupling between the incident electric field and the resistive load. As a result a voltage difference between the patch and the ground is developed, enabling current flow through the via which is subsequently absorbed by the lumped resistor. In this configuration the surface patch still supports in-plane current flow, but a portion of the induced surface current is now directed downward through the via into the lumped resistor. This asymmetry allows a net current to enter the resistor. This leads to resistive energy absorption as the induced current flows toward the lumped resistor. Under this condition the metasurface unit cell effectively harvests electromagnetic energy, with clear voltage peaks observable in simulation. Although
Figure 4a,b show strong current coupling due to the alignment between the electric field and the resistor position from the center of the patch, the current distribution patterns are slightly different. In
Figure 4a, where φ
p = 0° and the polarization angle φ = 0°, the current is concentrated along the vertical axis (y-direction). In contrast, in
Figure 4b, where φ
p = 10° and φ = 10°, the alignment results in a skew in the current flow concentration. This difference illustrates how variations in the geometric resistor position (φ
p) influence the orientation of the surface current.
The surface current distribution conditions when a voltage dip appears on the resistor is shown in
Figure 5a,b for Model A when the polarization angle is 90° and Model B when the polarization angle is 100°, respectively. For all models the surface current is observed to converge toward the via and subsequently diverge from it, with comparable current density on both the incoming and outgoing paths. This balance indicates that the current flows through the via without being diverted into the lumped resistor, indicating that the lumped resistor does not absorb any current. This occurs when the incident electric field is oriented perpendicular to the direction of the lumped resistor position from the center of the patch, such that it does not induce a potential difference between the patch and the ground. Consequently, no driving voltage is developed across the terminals of the lumped resistor. While the surface patch supports in-plane current flow driven by the incident electric field, these surface currents tend to converge toward the via. However, due to the geometric symmetry of the unit cell an equal amount of current diverges away from the via on the opposite side. This symmetric inflow and outflow form a balanced current pattern, resulting in minimal net current entering the resistor.
As illustrated in
Figure 5, the surface currents are distributed symmetrically around the via, and no power is dissipated in the resistor. Under these conditions the structure supports purely reactive surface current flow on the patch, characterized by the storage and exchange of electric and magnetic energy with negligible resistive energy absorption through the via–resistor path. Therefore, in this design the polarization-dependent behavior of the metasurface stems from the use of a single lumped resistor connected through a shifted via, which breaks the symmetry of an otherwise centrally symmetric patch structure, leading to variations in absorption depending on the polarization angle.
The frequency response of the metasurface under varying conditions can be categorized into two distinct effects: shifts caused by structural differences between models and shifts caused by changes in polarization within a single model. The first type of frequency shift arises from differences in the physical structure of the metasurface unit cell, specifically the position of the lumped resistor. In this study, Models A and B utilize point resistors placed along different axes (the
y-axis for
φp = 0° and the
x-axis for
φp = 10°, respectively). As shown in
Figure 2, even under the same polarization angle these two models exhibit different resonance frequencies. This difference is attributed to variations in the effective resonance conditions caused by the different resistor positions relative to the electric field distribution on the patch. The displacement of the resistor alters the local surface current flow and modifies the electromagnetic coupling, resulting in a shift in the frequency of maximum absorption.
The second type of frequency shift occurs within the same metasurface model when the polarization angle of the incident electric field is varied. For a given structure, rotating the polarization angle changes the alignment between the electric field and the resistor position, thereby altering the strength of the coupling between the incident wave and the resistive load. As a result, small shifts in the absorption frequency are observed as the polarization angle changes. This effect is evident in Models A and B, where variations in φ lead to corresponding shifts in the frequency at which maximum absorption occurs (see
Figure 2).
The second case simulation which is also carried out in this paper is that the via and resistor positions are varied at angles (
) of 30°, 60°, and 90° from the center of the patch, as shown in
Figure 6. The simulation results of this case of voltage at the lumped resistor are shown in
Figure 7. For each model in the second case, voltage dip appears when the lumped resistor is placed at a 90° angle to the electric field seen from the center of the unit cell. It can be seen that the voltage dips shift with changing lumped resistor positions. This means that there is also a relationship between the position of the lumped resistor and the central point of the patch in capturing RF wave energy.
The relationship between the dip angle and the geometric angle of the structure is shown in
Figure 8. Additional simulations were also performed for other angles (15°, 45°, 75°) as well to verify the observed relationship. This condition shows that there will always be a dip wherever the resistor is placed, which means polarization-independence will not be possible with this design. There are two points emphasized by these results: (1) the dip angle does not depend on frequency but is determined by the geometry of the structure itself; (2) there is a clear relationship between the position of the resistor relative to the center of the patch and the resulting dip angle. To further validate this observation we also simulated a circular patch structure using one via and a resistor, and we confirmed a similar relationship between the resistor position from the patch center and the dip angle.
3.2. Measurement Results
To validate the polarization characteristics of the square patch metasurface energy-harvesting experimentally, four 10 × 10 arrays were fabricated, with via positions from the center of the patch (
) at angles of 0°, 30°, 45°, and 60°, as shown in
Figure 9a,b. The 10 × 10 array configuration was selected to provide an adequate electromagnetic response for experimental validation, minimizing edge effects and enhancing the measurement accuracy of the metasurface’s polarization characteristics.
The metasurface was fabricated using an FR-4 substrate with a thickness of 1 mm, and other parameters were set to be the same as those listed in
Table 1. The total size of each 10 × 10 array is 15 cm × 15 cm. The front of the unit cell and the back-side of the ground plane were coated with a green resist to prevent oxidation and avoid short circuits during component soldering. A dedicated soldering pad pattern was provided on each unit cell on the ground plane for mounting a lumped resistor or a connector, as shown in
Figure 9b. The metasurface was illuminated by a horn antenna connected to a vector network analyzer (VNA) positioned at a distance of 110 cm (R = 110 cm), providing incident power uniformly across all unit cells. The distance R was determined based on the horn antenna’s aperture to ensure far-field conditions. All measurements were conducted inside an anechoic chamber to eliminate reflections and external electromagnetic interference. In the experimental setup shown in
Figure 9c, a Rohde & Schwarz ZVB VNA and an A-INFO LB-10125-SF broadband horn antenna were used to measure the transmission coefficient (S21) of the designed metasurface. The VNA was calibrated using the UOSM (Unknown Through–Open–Short–Match) method with a Rohde & Schwarz ZN-Z51 calibration kit, including the connected cables, prior to conducting the measurements. The S21 parameter, representing the harvested signal through the lumped resistor, was then compared with the simulation results. The central unit cell was chosen for measurement due to its minimal edge effects and closest to the conditions of an infinite array. The measurement connection was established using a U.FL connector, which was soldered onto the metasurface and modeled in the simulation as a lumped resistor oriented in a specific direction. To emulate the electromagnetic coupling environment observed in the simulations, all other output ports from the unit cells in the array were terminated with 50 Ω loads by soldering lumped resistors onto the designated pads (see
Figure 9b). To vary the polarization angle during the experiment the metasurface was rotated while the transmitting horn remained stationary. The center of the metasurface was precisely aligned with the center of the horn’s aperture.
To make a fair comparison between simulation and measurement, the measured S21 parameter from the VNA is interpreted as an indicator of the voltage across the 50 ohm resistor. In the experiment, the metasurface was illuminated by a plane wave, and the central unit cell was connected to port 2 of the VNA through a matched coaxial connector. The S21 value thus reflects the amount of power that is harvested and delivered through the lumped resistor.
Although S21 is measured as a transmission coefficient, it can be considered proportional to the voltage across the resistor under the assumption of proper impedance matching. While absolute values may differ slightly due to losses or imperfections, the measured S21 remains a reliable proxy for comparing the polarization response of the system. To compare the simulation and measurement results, both datasets were normalized so that their maximum values correspond to the same reference point. This normalization allows a direct visual comparison of the voltage trends as a function of the polarization angle.
As shown in
Figure 10, the measurement results confirm the simulation results that the square patch metasurface energy harvesting using one via and one resistor has polarization-dependent characteristics. This can be observed from the change in voltage value against the polarization angle, which is consistent with the measurement and simulation results. Therefore, the key outcome is the agreement achieved between the measurement and simulation results. Both the simulation and measurement results exhibit a voltage dip at the same polarization angle for each design; however, the dip observed in the measurement is not as deep as that in the simulation. The difference in polarization angular characteristics, particularly in terms of voltage dip, can be attributed to practical factors present in the measurement setup. These include edge effects from the finite metasurface array, parasitic elements from coaxial cable connections, minor misalignments during rotation, and the influence of measurement noise. The simulation assumes an ideal infinite array with perfect symmetry and noiseless conditions. A small shift in the frequency of the maximum voltage was observed between the simulation and measurement results for each metasurface model, ranging from 174 MHz to 234 MHz. Specifically, for the designs with via positions φ
p = 0°, 30°, 45°, and 60°, the simulated maximum voltage frequency was consistently 5.114 GHz, while the corresponding measured frequencies were 4.88 GHz, 4.91 GHz, 4.90 GHz, and 4.94 GHz, respectively. The shift in maximum voltage frequency may arise from fabrication-related imperfections, such as slight deviations in via placement, soldering inaccuracies in the lumped resistor connections, and the connector. Furthermore, material properties such as the dielectric constant and loss tangent of the FR-4 substrate may be different from the ideal values used in simulations, contributing to the observed frequency offset.