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Journal: Appl. Sci., 2024
Volume: 14
Number: 8285
Article:
Nano-CeO2 for the Photocatalytic Degradation of the Complexing Agent Citric Acid in Cu Chemical Mechanical Polishing
Authors:
by
Yihang Liu, Zongmao Lu, Jiajie Wang, Jinghui Lai, Ziyang Li, Chu Zhang and Yuhang Qi
Link:
https://www.mdpi.com/2076-3417/14/18/8285
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