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Journal: Appl. Sci., 2022
Volume: 12
Number: 5684
Article:
Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment
Authors:
by
Ching-Ming Ku and Stone Cheng
Link:
https://www.mdpi.com/2076-3417/12/11/5684
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