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Journal: Appl. Sci., 2022
Volume: 12
Number: 5684

Article: Factor Design for the Oxide Etching Process to Reduce Edge Particle Contamination in Capacitively Coupled Plasma Etching Equipment
Authors: by Ching-Ming Ku and Stone Cheng
Link: https://www.mdpi.com/2076-3417/12/11/5684

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