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Metals 2014, 4(4), 639-646;

Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium

Department Chemical Surface and Reaction Technology, Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstraße 28, Dresden 01277, Germany
Department Metallic Technologies and Surface Engineering, Airbus Group Innovations Department, IW-MS, Munich 81663, Germany
These authors contributed equally to this work.
Author to whom correspondence should be addressed.
Received: 8 October 2014 / Revised: 29 October 2014 / Accepted: 16 December 2014 / Published: 22 December 2014
(This article belongs to the Special Issue Titanium Alloys)
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This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process. View Full-Text
Keywords: SiO2 film; AP-PECVD; titanium alloy; adhesion layer; wedge test SiO2 film; AP-PECVD; titanium alloy; adhesion layer; wedge test

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Kotte, L.; Haag, J.; Mertens, T.; Kaskel, S. Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium. Metals 2014, 4, 639-646.

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