Metals 2014, 4(4), 639-646; https://doi.org/10.3390/met4040639
Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium
1
Department Chemical Surface and Reaction Technology, Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstraße 28, Dresden 01277, Germany
2
Department Metallic Technologies and Surface Engineering, Airbus Group Innovations Department, IW-MS, Munich 81663, Germany
†
These authors contributed equally to this work.
*
Author to whom correspondence should be addressed.
Received: 8 October 2014 / Revised: 29 October 2014 / Accepted: 16 December 2014 / Published: 22 December 2014
(This article belongs to the Special Issue Titanium Alloys)
Abstract
This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process. View Full-TextKeywords:
SiO2 film; AP-PECVD; titanium alloy; adhesion layer; wedge test
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MDPI and ACS Style
Kotte, L.; Haag, J.; Mertens, T.; Kaskel, S. Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium. Metals 2014, 4, 639-646.