3.1. Formation of MAPbI3 Active Layers with PTE Surfactant Incorporation on NiOx HTLs
Figure 1a schematically illustrates the fabrication concept and interfacial design strategy employed in this study for MAPbI
3 photodiodes incorporating PTE on thermally optimized NiO
x HTLs. The approach is based on the introduction of a ppm-level polymeric surfactant directly into the MAPbI
3 precursor solution as opposed to inserting an additional discrete interlayer, thereby enabling the molecular-scale modulation of the NiO
x/MAPbI
3 interface during the perovskite film formation.
As shown in
Figure 1a, the device-relevant heterostructure consists of an ITO/NiO
x/MAPbI
3 stack for which the NiO
x HTL annealed at 300 °C provides a Ni
3+-rich p-type surface with favorable energetics for hole extraction, as described in
Section 2.3. During the spin-coating of the MAPbI
3 precursor containing PTE, the amphiphilic PTE molecules are distributed throughout the wet perovskite film while simultaneously interacting with the underlying NiO
x surface. The polar poly(oxyethylene) segments of PTE can coordinate with surface oxygen and nickel sites on NiO
x, whereas the alkyl chains are oriented toward the perovskite matrix. This configuration is expected to induce an interfacial dipole and modify local nucleation behavior without disrupting the bulk perovskite lattice [
36,
42,
43,
44,
45,
46].
Figure 1b presents photographic images of representative films, specifically a bare NiO
x layer annealed at 300 °C and MAPbI
3 films fabricated without PTE (pristine MAPbI
3) and with PTE concentrations of 30 ppm (MAPbI
3–PTE30) and 60 ppm (MAPbI
3–PTE60). All perovskite films exhibit uniform coverage over a 1.5 cm × 3.0 cm substrate area with no visible macroscopic defects, indicating that the incorporation of PTE does not compromise large-area film formation or processability. The subtle differences in the optical appearance upon the incorporation of PTE suggest changes in microstructural or interfacial properties rather than variations in the film thickness or phase purity.
The fabrication strategy adopted here is specifically designed to decouple bulk perovskite properties from interfacial electronic modification. By introducing PTE at ppm levels into the precursor solution, the intrinsic optical absorption and crystal structure of MAPbI
3 are preserved, while interfacial interactions at the NiO
x/MAPbI
3 interface are selectively tuned. This approach differs fundamentally from conventional interlayer insertion or bulk doping strategies, which often alter charge-transport pathways or introduce additional series resistance [
47,
48,
49].
To verify that PTE modifies the NiO
x surface directly prior to perovskite deposition, independent of perovskite crystallization effects, water-contact-angle measurements of NiO
x films coated with DMF/DMSO solutions containing only PTE (without MAPbI
3 precursors) were taken. Representative droplet images for pristine NiO
x, NiO
x coated with 30 ppm PTE, and NiO
x coated with 60 ppm PTE are shown in
Figure A1. Pristine NiO
x exhibits a highly hydrophilic surface with a contact angle of 15°, consistent with its polar Ni
3+–O-rich surface. Upon the addition of 30 ppm PTE, the contact angle increases to 20°, while 60 ppm PTE yields a value of 17°, indicating systematic modification of surface wettability by adsorption of the polymeric surfactant.
The increased contact angle reflects a reduction in the surface free energy of NiO
x due to the adsorption of amphiphilic PTE molecules. Based on the Young–Dupré relation, the decreases in cos θ from 0.967 (pristine) to 0.942 (30 ppm) and 0.958 (60 ppm) correspond to an interfacial free energy reduction on the order of 2–3%, consistent with the formation of a molecularly thin organic overlayer rather than a thick insulating film [
50]. Because these measurements were taken in the absence of MAPbI
3, they isolate the PTE–NiO
x interaction and demonstrate that PTE spontaneously adsorbs and modifies the surface polarity of NiO
x prior to perovskite deposition.
The non-monotonic behavior (30 ppm > 60 ppm) further suggests an optimal surface-coverage regime in which PTE forms a molecular-scale, electronically active interfacial layer. This adsorption-induced modification provides a physical basis for the interfacial vacuum-level realignment quantified by subsequent UPS measurements, consistent with established models of polymer-stabilized interfacial dipoles at hybrid oxide/organic interfaces [
51].
As will be shown in the following sections, this polymer-mediated interfacial modulation influences (i) perovskite crystallization behavior and grain evolution (
Section 3.2), (ii) the bulk optical and structural integrity (
Section 3.3), and (iii) the interfacial electronic structure and energy-level alignment (
Section 3.4 and
Section 3.5). These effects collectively underpin the enhanced carrier extraction, reduced noise, and improved photodetector performance observed at the device level (
Section 3.6,
Section 3.7 and
Section 3.8).
3.2. Morphological Evolution of MAPbI3 Films Induced by PTE Surfactant Incorporation
Based on the fabrication strategy described in
Section 3.1, the effects of incorporating PTE on the morphology of MAPbI
3 films deposited on NiO
x HTLs were systematically examined. Given that interfacial crystallization and grain evolution play critical roles in charge transport and recombination processes in perovskite photodiodes, a top-view SEM analysis was conducted to visualize the surface morphology and grain-size distribution of the perovskite layers directly.
Figure 2a compares representative SEM images of pristine MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 films deposited on NiO
x HTLs annealed at 300 °C.
The pristine MAPbI
3 film exhibits continuous surface coverage with densely packed polycrystalline grains of a moderate lateral size, accompanied by a relatively high density of grain boundaries. Such grain boundaries are known to act as preferential sites for trap-assisted recombinations and ionic migration, which can limit the carrier collection efficiency and increase noise under self-powered operation [
31,
52,
53].
Upon the incorporation of PTE at a concentration of 30 ppm, a pronounced change in the surface morphology is observed. The MAPbI3–PTE30 film shows enlarged grains with smoother grain boundaries and a reduced density of small crystallites. This indicates a decrease in the heterogeneous nucleation density during film formation and enhanced lateral grain growth. Increasing the PTE concentration to 60 ppm leads to a more uniform grain structure with a narrower size distribution, suggesting a more homogeneous crystallization process across the film.
The corresponding grain-size distributions extracted from the SEM images are summarized in
Figure 2b. A quantitative analysis reveals a progressive increase in the average grain diameter from 119 nm for pristine MAPbI
3 to 124 nm for MAPbI
3–PTE30 and 137 nm for MAPbI
3–PTE60, accompanied by a pronounced extension of the maximum grain size from 272 nm to 330 nm and 415 nm, respectively. This evolution indicates a systematic shift toward larger and more heterogeneous grains with an increase in the PTE concentration, together with clear suppression of the small-grain population. This trend demonstrates that PTE modulates not only the nucleation density but also the lateral grain-growth kinetics during perovskite film formation.
The observed morphological evolution can be rationalized by considering the amphiphilicity of PTE introduced during film formation. As discussed in
Section 3.1, PTE molecules distributed within the precursor solution and near the NiO
x/MAPbI
3 interface can reduce local surface energy fluctuations and moderate the interaction between the perovskite precursors and the NiO
x surface. This effect suppresses excessive heterogeneous nucleation at the interface while promoting controlled crystal growth and grain coalescence [
33,
37,
54]. Importantly, this modulation occurs without introducing a discrete interlayer or altering the bulk composition of MAPbI
3.
Despite these pronounced changes in the grain morphology, all films remain dense and pinhole-free, indicating that incorporating PTE does not compromise the film continuity or coverage. This is consistent with the uniform macroscopic appearance shown in
Figure 1b and confirms that the surfactant-assisted approach preserves processability and scalability.
For a more in-depth evaluation of whether PTE incorporation affects vertical film uniformity or interface-relevant roughness beyond the lateral grain evolution observed via SEM, three-dimensional (3D) optical profilometry was performed over large-area regions of the perovskite films. Representative surface maps and line profiles for MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 films are provided in
Figure A2. The root-mean-square (RMS) roughness values were found to be very similar for all samples, within experimental uncertainty levels (approx. 2.9–3.4 nm), indicating that the ppm-level PTE incorporation does not induce additional surface corrugation, thickness non-uniformity, or vertical inhomogeneity at length scales relevant to interfacial charge extraction.
Collectively, the SEM-based lateral grain analysis and large-area 3D profilometry results demonstrate that PTE incorporation primarily modifies the lateral morphology while preserving the vertical film uniformity. The absence of systematic roughness variation indicates that roughness-induced geometric effects are not the dominant origin of the improved device performance. Instead, these results support an interfacial electronic mechanism governed by dipole-induced vacuum-level realignment at the NiO
x/MAPbI
3 interface, as elucidated by the UPS analysis (
Section 3.4 and
Section 3.5) [
51,
55].
3.3. Optical and Structural Integrity of MAPbI3 Films Incorporating PTE
To evaluate any potential changes in the bulk optoelectronic properties associated with PTE-induced morphological evolution, the optical absorption capabilities and the crystal structures of the MAPbI
3 films on the NiO
x HTLs were systematically investigated. UV–vis absorption spectroscopy and XRD measurements were performed on pristine MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 films, as summarized in
Figure 3.
Figure 3a presents the UV–vis absorption spectra of the three films. All samples exhibit strong and broadband absorption across the visible region, extending from approximately 300 to 780 nm, which is characteristic of the intrinsic bandgap of MAPbI
3. Importantly, the absorption onset, spectral shape, and overall profile remain nearly identical for all PTE concentrations. No discernible shift in the absorption edge or the emergence of additional absorption features could be observed upon PTE incorporation. These results indicate that the optical bandgap and light-harvesting capability of MAPbI
3 are preserved, and that the incorporation of PTE does not introduce bulk electronic perturbations or secondary phases that affect optical absorption [
56].
Any slight differences in the absorption intensity are primarily associated with grain-size-dependent surface morphology effects (
Section 3.2) rather than intrinsic changes in the electronic structure. The absence of band-edge modifications confirms that the enhanced device performance reported in later sections does not originate from changes in the bulk absorption or photogeneration efficiency.
The structural properties of the MAPbI
3 films were more closely examined by XRD, as shown in
Figure 3b. All films display sharp diffraction peaks at approximately 14.4°, 28.9°, and 30.7°, corresponding to the (110), (220), and (310) crystallographic planes of the tetragonal MAPbI
3 phase, respectively [
5]. The absence of additional impurity-related peaks confirms high phase purity for all samples regardless of the PTE concentration. Moreover, the peak positions remain unchanged within the experimental resolution, indicating that the lattice parameters and crystal symmetry of MAPbI
3 are preserved upon PTE incorporation.
While the overall crystal phase and structural integrity remain unchanged, subtle variations in the relative peak intensities are observed among the samples. These variations are consistent with the grain-size enlargement and modified crystallization behavior induced by PTE, as larger and more uniform grains can influence the preferred orientation and diffraction volume without altering the underlying crystal structure [
57]. No discernible peak broadening or degradation of the crystallinity is observed, confirming that PTE incorporation does not adversely affect the crystalline quality of MAPbI
3.
Taken together, the UV–vis and XRD results demonstrate that ppm-level PTE incorporation does not modify the intrinsic optical absorption, band structure, or crystal phase of MAPbI
3. Instead, PTE influences interfacial interactions and the crystallization kinetics, yielding an improved morphology while preserving the bulk material integrity. This distinction indicates that the performance enhancements discussed below stem from interfacial and morphological optimization rather than bulk electronic modification. Accordingly, the following section directly probes the interfacial electronic structure by UPS (
Section 3.4) to elucidate the energy-level alignment and charge-extraction mechanisms.
3.4. Interfacial Electronic Structure Modulation Probed by UPS
To elucidate the effect of polymer-mediated interfacial engineering on the electronic structure at the NiO
x/MAPbI
3 junction more directly, UPS measurements were taken by means of He I (21.22 eV) excitation. UPS spectra were collected for bare NiO
x films annealed at 300 °C, pristine MAPbI
3 films, and MAPbI
3 films incorporating PTE at concentrations of 30 and 60 ppm (MAPbI
3–PTE30 and MAPbI
3–PTE60), as summarized in
Figure 4. Because the NiO
x HTL was fixed at its thermally optimized condition throughout this study, the UPS-observed changes in WF and apparent valence-band onset can be consistently interpreted as arising from polymer-induced electrostatic vacuum-level shifts (Δ
VLs) rather than from modifications of the intrinsic bulk electronic structure of either NiO
x or MAPbI
3 [
51,
55].
Figure 4a shows the secondary-electron cutoff regions used to determine the WFs of the respective layers. The thermally optimized NiO
x film exhibits a WF of approximately 4.64 eV, consistent with its Ni
3+-rich p-type electronic characteristic and with previously reported values for sol–gel-derived NiO
x annealed at comparable temperatures [
26]. Upon the deposition of pristine MAPbI
3, the WF increases to approximately 4.75 eV, corresponding to a slight vacuum-level step-up (+0.11 eV) relative to NiO
x.
Notably, the incorporation of PTE induces systematic and concentration-dependent changes in the vacuum-level alignment. For MAPbI
3–PTE30, the WF decreases to approximately 4.19 eV, while MAPbI
3–PTE60 exhibits a WF of approximately 4.27 eV. This non-monotonic but clearly PTE-dependent shift in the WF provides direct evidence of the formation of an interfacial dipole layer associated with PTE molecules. The amphiphilic structure of PTE, comprising polar poly(oxyethylene) segments and hydrophobic alkyl chains, enables dipole formation at the NiO
x/MAPbI
3 interface via the interaction of the polar moieties with the surface sites of NiO
x while the alkyl chains extend toward the perovskite layer. Such dipole-induced Δ
VL values are a well-established signature of interfacial electronic modulation rather than bulk electronic alterations [
45,
46,
58,
59].
Figure 4b displays the valence-band regions near the Fermi level (
EF). The VBM positions were determined relative to
EF by linear extrapolation of the leading edge of the valence-band spectra, following established UPS analysis procedures. Pristine MAPbI
3 exhibits a VBM located approximately 1.24 eV below
EF, whereas the MAPbI
3–PTE30 and MAPbI
3–PTE60 samples display VBM positions at approximately 1.44 and 1.42 eV below
EF, respectively. In comparison, the VBM of NiO
x is located at approximately 0.84 eV below
EF, consistent with its p-type characteristic.
These results indicate that the incorporation of PTE modifies the interfacial band alignment by shifting the effective valence-band energetics of MAPbI
3 relative to NiO
x. Notably, this shift originates from vacuum-level modulation associated with interfacial dipole formation rather than from any alteration of the intrinsic electronic structure of the perovskite bulk. This interpretation is fully consistent with the unchanged optical absorption edges and crystal structures confirmed by the UV–vis and XRD analyses (
Section 3.3).
It should be emphasized that the UPS trends observed here reflect interfacial electronic tuning confined to the near-surface region as probed by UPS rather than long-range doping or bulk band-structure modifications. In this context, PTE functions as a nonionic polymeric surfactant that physically adsorbs at the NiO
x/MAPbI
3 interface and lacks reactive functional groups capable of forming covalent or coordinative bonds with Ni, Pb, or I species. Accordingly, the observed WF changes are attributed to dipole-induced Δ
VLs rather than to chemical bonding or intrinsic band-edge modifications of MAPbI
3 [
51].
Taken together, the UPS results demonstrate that ppm-level incorporation of PTE enables controlled modulation of the vacuum-level alignment at the NiOx/MAPbI3 interface without perturbing the intrinsic bulk electronic structure of the perovskite. While the valence-band onset of MAPbI3 exhibits an apparent shift of approximately 0.18–0.20 eV relative to EF upon PTE incorporation, this shift occurs concurrently with an equivalent displacement of the vacuum level, as evidenced by the secondary-electron cutoff. This behavior unambiguously identifies a rigid, dipole-induced ΔVL rather than intrinsic band-edge movement or bulk doping of MAPbI3.
The magnitude of this Δ
VL can be quantitatively interpreted using the classical Helmholtz relation, ΔΦ =
Nμ
⊥/ε
0, which links the WF change to the interfacial dipole density (
N) and the perpendicular dipole moment (μ
⊥) [
51,
55]. Using literature-reported values of μ
⊥ for poly(oxyethylene)-based amphiphilic molecules (μ ≈ 2–3 D), the experimentally observed WF reductions of −0.45 eV (PTE30) and −0.37 eV (PTE60) correspond to interfacial dipole densities on the order of 10
13 cm
−2.
Importantly, the polymeric attribute of PTE further stabilizes this interfacial dipole through chain entanglement and reduced molecular mobility, distinguishing it from the more transient dipoles typically formed by small-molecule interfacial modifiers [
60,
61]. As a result, even ppm-level PTE incorporation generates a dense and electronically stable interfacial dipole layer while preserving the MAPbI
3 bulk band structure, consistent with the unchanged UV–vis absorption and XRD results (
Section 3.3).
These UPS-derived ΔVL values are explicitly incorporated into the revised energy-level diagrams to clarify how polymer-stabilized dipole formation reduces the hole-extraction barrier (ΔEH) at the NiOx/MAPbI3 interface under self-powered operation, thereby enabling enhanced charge extraction, suppressed interfacial recombinations, and improved device performance.
3.5. Energy-Level Alignment and Charge-Extraction Mechanism at the NiOx/MAPbI3 Interface
Building on the UPS analysis in
Section 3.4, the role of PTE-mediated interfacial electronic modulation in charge extraction was examined through an energy-level diagram analysis and was correlated with the device photoresponse.
Figure 5a presents energy-level diagrams of MAPbI
3 photodetectors fabricated on NiO
x HTLs annealed at 300 °C, comparing pristine and PTE-modified devices. These diagrams explicitly include vacuum-level positions extracted from UPS measurements, allowing the PTE-induced Δ
VL to be clearly distinguished from intrinsic band-edge positions.
The energy-level diagrams were established using UPS-extracted WFs and VBM positions (
Figure 4), together with reported conduction-band levels of MAPbI
3 and the ETLs [
12,
26]. Building on the UPS analysis in
Section 3.4, the energy-level diagrams in
Figure 5a explicitly distinguish dipole-induced Δ
VL values from the intrinsic band-edge positions of MAPbI
3. In pristine devices, a finite energetic offset at the NiO
x/MAPbI
3 interface forms a barrier for hole extraction under self-powered operation. Upon the incorporation of PTE, the vacuum level undergoes a pronounced downward shift of approximately 0.37–0.45 eV, while the apparent movement of the MAPbI
3 valence-band onset tracks this displacement, indicating a rigid electrostatic offset rather than intrinsic band-edge reconstruction.
This Δ
VL-driven realignment directly reduces the effective Δ
EH by approximately the same magnitude and without invoking additional band bending or bulk band-edge reconstruction, consistent with classical interfacial dipole models [
51]. Equivalently, the entire perovskite energy manifold is rigidly shifted closer to the NiO
x VBM due to vacuum-level realignment rather than through intrinsic modification of the MAPbI
3 band structure. This dipole-mediated energetic realignment provides a direct physical basis for the enhanced hole extraction and suppressed interfacial recombinations observed in PTE-modified devices.
Upon the incorporation of PTE, the interfacial energy-level alignment is systematically modified. As indicated by the UPS results, PTE induces a ΔVL that effectively adjusts the relative position of the MAPbI3 VBM with respect to NiOx. This modulation reduces the energetic mismatch at the NiOx/MAPbI3 interface, lowering the effective barrier for hole transfer from the perovskite absorber into the NiOx HTL. Importantly, this effect is achieved without introducing a discrete interlayer or altering the bulk band structure of MAPbI3, confirming that PTE functions as an interfacial electronic modifier rather than a dopant.
The physical origin of this energy-level modulation can be attributed to the formation of an interfacial dipole associated with the PTE molecules. The polar poly(oxyethylene) segments of PTE preferentially interact with NiO
x surface sites, while the alkyl chains orient toward the MAPbI
3 layer, establishing an interfacial dipole whose net moment generates the observed Δ
VL. This dipole-driven vacuum-level realignment produces an energetic step-down that lowers the effective Δ
EH, thereby facilitating hole transfer from MAPbI
3 into NiO
x under self-powered operation while preserving the intrinsic electronic structure of the perovskite. This asymmetric energy-level modulation minimizes interfacial carrier accumulation and nonradiative recombinations, providing a direct physical basis for the enhanced hole extraction and suppressed interfacial recombinations which in turn leading to the reduced electronic noise and improved device performance observed in PTE-modified self-powered photodiodes [
15].
Although PTE incorporation induces moderate grain-size enlargement (
Section 3.2), the dominant origin of the device-performance enhancement arises from interfacial electronic modulation rather than bulk morphological effects. UV–vis absorption and XRD analyses (
Section 3.3) confirm that the optical bandgap, crystal phase, and crystallinity of MAPbI
3 remain essentially unchanged upon the addition of PTE, excluding significant bulk electronic modification.
In contrast, UPS measurements (
Section 3.4), together with the revised energy-level diagrams (
Figure 5a), reveal pronounced dipole-induced Δ
VL values at the NiO
x/MAPbI
3 interface without measurable intrinsic band-edge movements of MAPbI
3. This behavior provides direct evidence of polymer-induced interfacial energetic realignment rather than bulk doping or band-structure modifications [
51]. The magnitude of this Δ
VL directly reduces the effective Δ
EH for hole transport from MAPbI
3 into NiO
x under self-powered operation, establishing a quantitative energetic link between interfacial dipole formation and enhanced device performance.
While enlarged and more uniform grains can reduce grain-boundary trapping and support carrier transport [
43,
53], such morphological changes alone cannot account for the observed reductions in the extraction barrier, noise spectral density, and recombination losses. Instead, the close quantitative correlation between the PTE-induced Δ
VL values and the enhancements in the
EQE, responsivity, and detectivity demonstrates that interfacial energetics, rather than the morphology alone, governs charge extraction and noise suppression in these devices.
With regard to heterojunctions, the dipole-mediated vacuum-level alignment at the NiO
x/MAPbI
3 interface is conceptually analogous to the band-engineering strategies widely employed in graphene- and nanowire-based photodetectors, where built-in electric fields and band offsets are designed to promote carrier separation and suppress recombinations under self-powered operation [
62,
63]. Similarly, graphene/HgCdTe heterojunction infrared photodetectors enhance detectivity through barrier and band-alignment control at the junction interface [
64].
In contrast to these structurally complex heterojunction architectures, the present MAPbI
3 photodiodes achieve effective interfacial energy-level optimization through polymer-stabilized dipole formation induced by ppm-level PTE incorporation during perovskite film formation. As clarified by the UPS-based energy-level diagrams in
Figure 5a, PTE incorporation induces a dipole-driven vacuum-level step-down from NiO
x to MAPbI
3, which energetically facilitates hole extraction from MAPbI
3 toward NiO
x under self-powered (zero-bias) operation. This dipole-mediated mechanism reduces the effective Δ
EH without relying on conventional heterojunction band bending or introducing an additional discrete interlayer. Overall, this comparison underscores the contention that polymer-enabled interfacial dipole engineering provides a fundamentally simpler yet scalable route to interfacial electronic optimization for self-powered photodetectors while retaining performance metrics comparable to those achieved using graphene- or nanowire-based heterojunction platforms.
The consequences of this optimized energy-level alignment are directly manifested in the
EQE spectra shown in
Figure 5b. Compared with pristine MAPbI
3 devices, both MAPbI
3–PTE30 and MAPbI
3–PTE60 exhibit systematically enhanced
EQE values across the visible spectral range, with the most pronounced improvement observed near 640 nm. At this wavelength, the
EQE increases from 78.7% for pristine MAPbI
3 to 84.1% and 84.6% for devices incorporating 30 and 60 ppm PTE, respectively. These enhancements are fully consistent with the suppressed interfacial recombinations and more efficient hole extraction enabled by the improved valence-band alignment at the NiO
x/MAPbI
3 interface.
Notably, the overall spectral shape of the EQE curves remains unchanged upon PTE incorporation, indicating that the fundamental photo-generation and transport mechanisms are preserved. This enhancement arises primarily from increased carrier collection efficiency rather than changes in the optical absorption or charge-generation pathways. The close similarity between the EQE responses of the 30 and 60 ppm PTE devices further suggests that the interfacial modification saturates at low PTE concentrations, consistent with a surface-limited dipole formation mechanism.
Collectively, the energy-level diagrams and EQE results reveal that PTE-induced interfacial dipole formation selectively reduces ΔEH at the NiOx/MAPbI3 junction while maintaining balanced carrier transport. This energetically favorable interfacial configuration, enabled by polymer-stabilized dipole-mediated vacuum-level alignment at the NiOx/MAPbI3 interface, provides a consistent physical origin of the enhanced charge extraction, suppressed recombination, and improved device performance discussed in the subsequent analyses.
It should be noted that this interfacial modulation is concentration-dependent and saturates once sufficient polymer coverage is achieved at the interface. Increasing the polymer content further is therefore not expected to yield additional energetic benefits and may instead limit carrier transport by increasing the effective interfacial thickness or introducing partial insulating capability, as commonly observed in polymer-modified semiconductor interfaces [
65]. Accordingly, the present study focuses on the optimal low-ppm regime, while a systematic investigation of effects at higher concentrations will be reported separately.
3.6. Current–Voltage Characteristics and Photoresponse Linearity
Following the interfacial energy-level optimization discussed in
Section 3.5, device-level electrical characteristics were analyzed to assess the effect of PTE-assisted interfacial modulation on the photocarrier dynamics and photoresponse linearity under self-powered operation.
Figure 6 shows the
I–
V characteristics and light-intensity-dependent photoresponses of MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 photodiodes fabricated on NiO
x HTLs under 637 nm illumination.
Figure 6a presents representative semi-logarithmic
I–
V curves measured over a wide range of incident optical power levels together with the corresponding dark-current characteristics. All devices exhibit clear rectifying diode behavior with a low dark current near zero bias and a systematic increase in the photocurrent with an increase in the illumination intensity. The absence of abnormal leakages or hysteretic behavior indicates stable junction formation and the efficient separation of photogenerated carriers driven by the built-in electric field. Notably, the incorporation of PTE does not alter the overall diode polarity or rectification trend, confirming that the fundamental device architecture and transport pathways remain intact.
To gain insight into the recombination mechanisms and interfacial charge-transport behavior, the open-circuit voltage (
VOC) was analyzed as a function of the natural logarithm of the incident optical power (ln
P), as shown in
Figure 6b. Linear fitting of the
VOC–ln
P relationship yields slopes corresponding to ideality factors
n on the order of a unity to two (in units of
kBT/
e), indicating that trap-assisted recombinations remain the dominant recombination pathway for all devices under low-bias operation [
66]. The MAPbI
3–PTE60 device shows a slightly reduced slope compared with pristine MAPbI
3 that is attributable to the partial mitigation of interfacial recombination losses. This trend is in agreement with the reduced energetic barrier and improved hole-extraction characteristics inferred from the interfacial energy-level alignment discussed in
Section 3.5.
Complementary information pertaining to the charge-collection behavior is obtained from the short-circuit current (
ISC) dependence on the incident optical power, as plotted on a log–log scale in
Figure 6c. All devices display an approximately linear relationship between
ISC and
P over more than five orders of magnitude. Power-law fitting using
yields exponents
θ close to unity for the MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 devices, confirming nearly ideal photodiode behaviors with efficient photocarrier extraction and negligible photoconductive gain or space-charge-limited effects within the investigated power range [
15]. The preservation of near-unity
θ values across all devices indicates that PTE incorporation does not alter the fundamental transport mechanism or introduce nonlinear response artifacts.
Despite the identical power-law exponents, the absolute magnitude of ISC is systematically enhanced for PTE-modified devices at a given illumination intensity. The elevated ISC levels observed for MAPbI3–PTE30 and MAPbI3–PTE60 directly reflect more efficient carrier collection under zero-bias conditions, in agreement with the reduced valence-band offset and facilitated hole extraction at the NiOx/MAPbI3 interface. These results demonstrate that PTE-assisted interfacial engineering increases the collection efficiency without compromising linearity or operational stability.
Based on the
ISC–
P characteristics in
Figure 6c, the zero-bias responsivity at 637 nm was evaluated using
Rλ =
IPH/
P, where
IPH =
Ilight −
Idark is the net photocurrent [
6,
8,
10,
15,
67]. The extracted
R637 values increase monotonically from 406 mA/W for pristine MAPbI
3 to 434 and 437 mA/W for the MAPbI
3–PTE30 and MAPbI
3–PTE60 devices, respectively. This monotonic enhancement corroborates the
EQE-derived responsivity trends discussed in
Section 3.5 and confirms that the improved interfacial energetics translate directly into higher light-to-current conversion efficiencies.
Overall, the combined I–V characteristics, VOC–ln P analysis findings, and ISC–P scaling results confirm that PTE incorporation at the NiOx/MAPbI3 interface preserves the fundamental photodiode physics while enabling more efficient charge collection and fewer interfacial recombinations. This electrical optimization directly supports the improved device characteristics and dynamic responses examined in the subsequent sections.
3.7. Spectral Responsivity, Noise Characteristics, and Detectivity
Building on the improved charge-collection efficiency and preserved linear photoresponse discussed in
Section 3.6, the sensitivity and noise characteristics of the MAPbI
3 photodetectors were systematically investigated to elucidate the impact of PTE-assisted interfacial engineering on noise-limited performance under self-powered operation.
The wavelength-dependent responsivity
Rλ was derived from the measured
EQE spectra using the equation
[
8].
Figure 7a presents the responsivity spectra of the MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 devices. All devices exhibit a broadband photoresponse across the visible region with a peak centered near 640 nm, consistent with the absorption profile of MAPbI
3. Upon the incorporation of PTE, the responsivity increases systematically across the entire spectral range. At 640 nm,
Rλ increases from 406.2 mA/W for pristine MAPbI
3 to 434.1 and 436.8 mA/W for MAPbI
3–PTE30 and MAPbI
3–PTE60, respectively. These values closely match the responsivities independently extracted from the
ISC–
P analysis (
Section 3.6), confirming that the enhanced photocurrent originates from improved charge extraction rather than photoconductive gain.
To evaluate the noise behavior, the current-noise spectral density (
in) was extracted from dark-current time traces by means of a
FFT analysis, as shown in
Figure 7b [
6,
7,
68,
69]. All devices exhibit predominantly frequency-independent noise over the measured range, indicating that white noise dominates under zero-bias operation. Notably, the PTE-modified devices display slightly reduced noise amplitudes (≈3.9 × 10
−14 A Hz
−1/2) compared with pristine MAPbI
3 (≈4.0 × 10
−14 A Hz
−1/2), reflecting suppressed electronic noise at the NiO
x/MAPbI
3 interface. This trend is consistent with the reduced interfacial recombinations and defect-assisted carrier fluctuations inferred from the
VOC–ln
P analysis (
Section 3.6).
Under self-powered (zero-bias) operation, noise in perovskite photodiodes is predominantly governed by thermal (Johnson) noise and trap-assisted generation–recombination (G–R) noise, while the contribution of shot noise remains negligible due to the extremely low dark current and near-equilibrium junction operation. In such junction-limited devices, interfacial defect states and carrier trapping–detrapping processes act as dominant sources of current fluctuations, particularly at low frequencies [
70].
The nearly flat noise spectra presented in
Figure 7b indicate that white noise dominates the 1/f noise within the measured frequency window, implying a reduced density of active interfacial fluctuations. Notably, this suppression of electronic noise directly correlates with the reduced
VOC–ln
P slopes observed for the PTE-modified devices (
Section 3.6), providing independent evidence of suppressed trap-assisted recombinations at the NiO
x/MAPbI
3 interface.
Together with the dipole-induced vacuum-level realignment revealed by UPS (
Section 3.4 and
Section 3.5), these results demonstrate that polymer-assisted interfacial dipole stabilization reduces interfacial carrier accumulation and G–R noise, thereby enabling enhanced noise-limited detectivity under self-powered operation. Under zero-bias self-powered operation, noise in perovskite photodiodes is primarily governed by thermal (Johnson) noise and G–R noise, as noted above, whereas pronounced 1/f noise typically arises under biased or photoconductive operation due to trap-assisted carrier capture and release processes [
70]. The nearly frequency-independent noise spectral density observed here therefore indicates that the present devices operate in a junction-limited regime within the measured frequency range.
Importantly, this junction-limited noise behavior is consistent with the dipole-induced vacuum-level step-down at the NiO
x/MAPbI
3 interface introduced by the incorporation of PTE. As revealed by UPS and illustrated in
Figure 5a, the vacuum-level alignment is converted from a slight step-up in the pristine interface to a pronounced step-down upon PTE incorporation, thereby facilitating hole extraction from MAPbI
3 toward NiO
x under self-powered operation. This dipole-driven energetic alignment suppresses interfacial carrier accumulation and reduces the fluctuation pathways associated with trap-assisted recombinations, providing evidence of a direct physical origin of the observed reduction in the noise spectral density. Consistently, the reduced
VOC–ln
P slopes for the PTE-modified devices (
Section 3.6) independently confirm suppressed interfacial recombinations, establishing coherent links among interfacial energetic modulation, recombination kinetics, and noise suppression.
Using the measured responsivity and current-noise spectral density, the noise-equivalent power (
NEP) was calculated according to
NEP =
in/
Rλ [
6,
7,
8,
9,
10]. As shown in
Figure 7c, the
NEP at 640 nm decreases from 98 fW for pristine MAPbI
3 to 91 and 89 fW for MAPbI
3–PTE30 and MAPbI
3–PTE60, respectively, reflecting the synergistic combination of enhanced responsivity and suppressed noise enabled by PTE-assisted interfacial modulation.
The specific detectivity
D* was subsequently evaluated using
, where
is the active area and
is the measurement bandwidth (1 Hz) [
6,
7,
8,
9,
10,
15,
67,
68]. As shown in
Figure 7d, the noise-limited detectivity reaches peak values of 2.50 × 10
12, 2.69 × 10
12, and 2.76 × 10
12 Jones at 640 nm for the MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 devices, respectively. The systematic increase in
D* with the PTE concentration suggests that enhanced carrier collection improves device sensitivity without inducing additional noise. Moreover, the preserved spectral shape of
D* indicates that the performance enhancement arises from interfacial electronic effects and not from bulk optical changes.
In addition to detectivity, the
LDR was evaluated to assess the ability of the devices to maintain a linear photoresponse over a wide range of illumination intensities, a capability critical for imaging and sensing applications. The
LDR is defined as
under noise-limited conditions [
6,
8,
10,
15,
67]. Notably, the
LDR values are evaluated under the same zero-bias and 1 Hz bandwidth conditions used for
NEP and
D* extraction, ensuring a consistent noise-limited comparison across devices. Using a maximum incident power
of 220 µW and the experimentally measured
NEP values at 640 nm, the
LDR values were estimated to be approximately 187.0, 187.7, and 187.9 dB for the MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 devices, respectively. The consistently high
LDR across all devices indicates that the incorporation of PTE does not compromise the linear operating range, while the combination of high responsivity and ultralow noise enables an exceptionally broad dynamic range. The ultrabroad
LDR arises from the combination of near-unity photocurrent scaling exponents and suppressed low-frequency noise, both of which are directly enabled by PTE-mediated interfacial electronic stabilization. This result highlights the advantage of polymer-assisted interfacial control in preserving linear operation over extremely wide dynamic ranges.
When benchmarked against the previously reported self-powered MAPbI
3 photodiodes summarized in
Table 1, the
D* values achieved here exceed those of devices employing NiO
x HTLs without polymer-induced interfacial dipole modulation and those based on PEDOT:PSS while also being comparable to or slightly higher than state-of-the-art MAPbI
3 photodiodes incorporating additional interlayers or dopants [
12,
26,
31,
32,
71,
72,
73]. Importantly, this competitive noise-limited detectivity is achieved under strict zero-bias operation while maintaining fast response dynamics and an ultrabroad
LDR.
Although many recent self-powered MAPbI3 photodiodes rely on additional interlayers, modified transport layers, or complex heterojunction architectures to enhance sensitivity, the present approach achieves comparable performance through a ppm-level polymeric surfactant directly incorporated into the perovskite precursor. By inducing a dipole-mediated ΔVL at the NiOx/MAPbI3 interface, this strategy reduces the effective ΔEH without introducing a discrete interlayer, thereby enabling molecular-scale interfacial modulation with minimal processing complexity. This comparison highlights how polymer-enabled interfacial dipole stabilization provides a simple and scalable route to simultaneously enhance responsivity, suppress electronic noise, and preserve response speeds in self-powered MAPbI3 photodiodes.
Beyond perovskite-only comparisons, it is also instructive to benchmark the present devices against graphene- and nanowire-based heterojunction photodetectors reported in the literature. Graphene/ZnO nanowire heterojunction photodetectors have demonstrated detectivity levels on the order of 10
11–10
12 Jones under zero or low bias, enabled by band-engineered junctions and built-in electric fields that promote efficient carrier separation and extraction [
62,
63]. Similarly, graphene/HgCdTe heterojunction infrared photodetectors achieve comparable detectivity levels through barrier and band-alignment control at complex heterointerfaces [
64].
In comparison, the MAPbI
3–PTE60 photodiodes reported here achieve a noise-limited detectivity of approximately 2.8 × 10
12 Jones under strict zero-bias operation using a significantly simpler, fully solution-processable perovskite diode type of architecture. Rather than relying on band-engineered heterojunctions or multilayer junction stacks, the present approach employs ppm-level polymeric surfactant incorporation to stabilize an interfacial dipole and induce a vacuum-level step-down from NiO
x to MAPbI
3, thereby energetically facilitating hole extraction from MAPbI
3 toward NiO
x. This comparison underscores the contention that polymer-enabled interfacial electronic modulation can deliver detectivity levels comparable to those of advanced graphene- or nanowire-based heterojunction photodetectors while offering clear advantages in terms of structural simplicity, processing compatibility, and scalability [
51].
In addition to the enhanced sensitivity, preliminary storage-stability tests indicate that the incorporation of PTE contributes to maintaining device stability. After approximately 500 h of ambient storage, the detectivity of all MAPbI
3 devices decreases by less than ~7%, with no evidence of accelerated degradation induced by the polymer additive. This modest degradation contrasts favorably with PEDOT:PSS-based perovskite optoelectronic devices, which are commonly associated with accelerated performance losses due to moisture ingress and interfacial corrosion [
74]. The improved stability observed here is attributed to the chemically inert NiO
x HTL combined with a spatially confined, polymer-stabilized interfacial dipole that preserves favorable energetic alignment without introducing hygroscopic or reactive interlayers. Because the devices operate under zero-bias self-powered conditions with an extremely low dark current, this ambient storage stability provides a meaningful first-order indicator of interfacial robustness in the absence of electrical stress. More extended stability studies will be reported in future work.
Collectively, the enhanced responsivity, suppressed noise, elevated detectivity, and ultrabroad LDR demonstrate that PTE-assisted interfacial engineering effectively amplifies the intrinsic advantages of thermally optimized NiOx HTLs. This clear correlation between molecular-level interfacial modulation and noise-limited sensitivity motivates the following investigations of the dynamic responses and weak-signal detection performances.
3.8. Temporal Response and Frequency-Dependent Detection Performance
Based on the enhanced responsivity, suppressed noise, and elevated detectivity demonstrated in
Section 3.7, the dynamic responses of the MAPbI
3 photodetectors were examined to assess the impact of PTE-assisted interfacial engineering on high-speed, self-powered operation.
Figure 8a shows representative photocurrent transients recorded under square-wave-modulated 637 nm illumination with an incident power of 220 μW at a modulation frequency of 2 kHz. All devices, in this case the MAPbI
3, MAPbI
3–PTE30, and MAPbI
3–PTE60 devices, exhibit sharp and reproducible on/off switching with stable baselines, confirming robust self-powered operation without external bias. Quantitative analyses yield nearly identical corresponding rise times (τ
r) of 59.4, 59.5, and 59.9 μs and decay times (τ
d) of 15.8, 15.9, and 15.9 μs. The nearly unchanged τ
r and τ
d values across all devices confirm that PTE-assisted interfacial modification does not hinder charge transport or induce additional interfacial charging, thereby maintaining fast carrier extraction dynamics.
The frequency dependence of the temporal response is summarized in
Figure 8b, where τ
r and τ
d are plotted as functions of the modulation frequency. For all devices, τ
r decreases gradually with an increase in the frequency up to the kilohertz regime, whereas τ
d remains nearly constant. The frequency dependence suggests limited modulation-rate sensitivity in the turn-on process, whereas recombination and discharge processes remain stable, demonstrating that PTE-assisted interfacial modification preserves high-speed device operation.
Figure 8c presents the normalized photocurrent amplitude as a function of the modulation frequency. All devices maintain flat normalized responses up to several kilohertz, followed by a gradual roll-off at higher frequencies. The −3 dB cutoff frequencies are located in the range of approximately 10–13 kHz for all three devices, consistent with the sub-100 μs rise and decay times extracted from the transient measurements. While the MAPbI
3–PTE60 device exhibits slightly higher normalized responses in the intermediate frequency range of approximately 1–5 kHz, the overall bandwidth remains comparable across all devices. These results indicate that the ultimate bandwidth is governed by intrinsic device properties rather than by interfacial modifications.
To evaluate the weak-signal detection in the frequency domain further, the
FFT amplitude spectra were acquired under ultralow-intensity illumination at 637 nm with an incident power of 190 pW modulated at 200 Hz (
Figure 8d). Distinct spectral peaks at the modulation frequency are clearly resolved for all devices, confirming reliable weak-signal detection under zero-bias operation. Notably, the PTE-modified devices exhibit higher
FFT signal amplitudes compared to those of pristine MAPbI
3, consistent with their enhanced responsivity and suppressed noise characteristics, as discussed in
Section 3.7.
Taken together, the temporal and frequency-domain analyses demonstrate that PTE-assisted interfacial engineering enables MAPbI3 photodetectors to achieve simultaneously high sensitivity and fast dynamic responses under self-powered operation. The preservation of rapid rise and decay times, kilohertz-level bandwidths, and reliable weak-signal detection confirms that molecular-level interfacial modulation enhances charge extraction and suppresses noise without compromising response speeds. Combined with the enhanced responsivity and detectivity discussed above, these results establish a coherent framework in which interfacial electronic optimization translates directly into robust, low-noise, and high-speed photodetector performance suitable for practical weak-light sensing and imaging applications.