Chiang, Y.-C.; Ho, C.-P.; Wang, Y.-L.; Chen, P.-C.; Wang, P.-Y.; Chen, H.-Y.
Vapor-Deposited Reactive Coating with Chemically and Topographically Erasable Properties. Polymers 2019, 11, 1595.
https://doi.org/10.3390/polym11101595
AMA Style
Chiang Y-C, Ho C-P, Wang Y-L, Chen P-C, Wang P-Y, Chen H-Y.
Vapor-Deposited Reactive Coating with Chemically and Topographically Erasable Properties. Polymers. 2019; 11(10):1595.
https://doi.org/10.3390/polym11101595
Chicago/Turabian Style
Chiang, Yu-Chih, Cuei-Ping Ho, Yin-Lin Wang, Po-Chun Chen, Peng-Yuan Wang, and Hsien-Yeh Chen.
2019. "Vapor-Deposited Reactive Coating with Chemically and Topographically Erasable Properties" Polymers 11, no. 10: 1595.
https://doi.org/10.3390/polym11101595
APA Style
Chiang, Y.-C., Ho, C.-P., Wang, Y.-L., Chen, P.-C., Wang, P.-Y., & Chen, H.-Y.
(2019). Vapor-Deposited Reactive Coating with Chemically and Topographically Erasable Properties. Polymers, 11(10), 1595.
https://doi.org/10.3390/polym11101595