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Open AccessArticle

Effective Pattern Intensity Artifacts Treatment for Electron Diffractive Imaging

1
IOM CNR Laboratorio TASC, Area Science Park-Basovizza, Bld MM SS 14, 34149 Trieste, Italy
2
Istituto di Cristallografia, Consiglio Nazionale delle Ricerche (IC-CNR), via Amendola 122/O, 70125 Bari, Italy
*
Author to whom correspondence should be addressed.
Present Address: Istituto Microelettronica e Microsistemi, Consiglio Nazionale delle Ricerche (IMM-CNR), Sezione di Lecce, Campus Universitario, via per Monteroni, 73100 Lecce, Italy
Academic Editor: Ronald W. Armstrong
Crystals 2017, 7(7), 186; https://doi.org/10.3390/cryst7070186
Received: 3 May 2017 / Revised: 12 June 2017 / Accepted: 21 June 2017 / Published: 24 June 2017
We present a method to treat spurious intensities in electron diffraction experiments. Coherent electron diffraction imaging requires proper data reduction before the application of phase retrieval algorithms. The presence of spurious intensities in the electron diffraction patterns makes the data reduction complicated and time consuming and jeopardizes the application of mathematical constraints to maximize the information that can be extracted from the experimental data. Here we show how the experimental diffraction patterns can be treated to remove the unwanted artifacts without corrupting the genuine intensities scattered by the specimen. The resulting diffraction patterns are suitable for the application of further processes and constraints aimed at deriving fundamental structural information by applying phase retrieval algorithms or other approaches capable of deriving quantitative atomic resolution information about the specimen structure. View Full-Text
Keywords: transmission electron microscopy; coherent diffraction imaging; electron diffraction; electron diffraction artifacts treatment; electron crystallography; data reduction transmission electron microscopy; coherent diffraction imaging; electron diffraction; electron diffraction artifacts treatment; electron crystallography; data reduction
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MDPI and ACS Style

Scattarella, F.; De Caro, L.; Siliqi, D.; Carlino, E. Effective Pattern Intensity Artifacts Treatment for Electron Diffractive Imaging. Crystals 2017, 7, 186.

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