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Journal: Crystals, 2024
Volume: 14
Number: 748
748
Article: Surface Recrystallization Model of Fully Amorphized C₃H₅-Molecular-Ion-Implanted Silicon Substrate
Authors: by Koji Kobayashi, Ryosuke Okuyama, Takeshi Kadono, Ayumi Onaka-Masada, Ryo Hirose, Akihiro Suzuki, Sho Nagatomo, Yoshihiro Koga, Koji Sueoka and Kazunari Kurita
Link: https://www.mdpi.com/2073-4352/14/9/748

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