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Journal: Crystals, 2024
Volume: 14
Number: 112
112
Article: TEM Image Analysis and Simulation Physics for Two-Step Recrystallization of Discretely Amorphized C₃H₅-Molecular-Ion-Implanted Silicon Substrate Surface
Authors: by Koji Kobayashi, Ryosuke Okuyama, Takeshi Kadono, Ayumi Onaka-Masada, Ryo Hirose, Akihiro Suzuki, Yoshihiro Koga, Koji Sueoka and Kazunari Kurita
Link: https://www.mdpi.com/2073-4352/14/2/112

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