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Journal: Crystals, 2020
Volume: 10
Number: 136

Article: Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
Authors: by Zhigang Xiao, Kim Kisslinger, Sam Chance and Samuel Banks
Link: https://www.mdpi.com/2073-4352/10/2/136

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