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Micromachines 2018, 9(6), 298; https://doi.org/10.3390/mi9060298

Multiscale Analysis of Size Effect of Surface Pit Defect in Nanoindentation

1
Department of Aeronautics and Astronautics, Fudan University, Shanghai 200433, China
2
Institute of Measurement and Testing Technology, Shanghai 201203, China
*
Author to whom correspondence should be addressed.
Received: 24 May 2018 / Revised: 4 June 2018 / Accepted: 10 June 2018 / Published: 13 June 2018
(This article belongs to the Special Issue Small Scale Deformation using Advanced Nanoindentation Techniques)
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Abstract

The nanoindentation on a pit surface has been simulated using the quasicontinuum method in order to investigate the size effect of surface pit defect on the yield load of thin film. Various widths and heights of surface pit defect have been taken into account. The size coefficient has been defined as an index to express the influence of the width or height of surface pit defect. The results show that as the size coefficient of width (of height) increases, at first the yield load of thin film decreases extremely slowly, until the size coefficient of width equals approximately one unit (half unit), at which point the yield load experiences an obvious drop. When the size coefficient of width (of height) reaches approximately two units (one unit), the yield load is almost the same as that of the nanoindentation on a stepped surface. In addition, the height of surface pit defect has more influence than the width on the yield load of thin film. View Full-Text
Keywords: multiscale; quasicontinuum method; surface pit defect; size effect multiscale; quasicontinuum method; surface pit defect; size effect
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Zhang, Z.; Ni, Y.; Zhang, J.; Wang, C.; Ren, X. Multiscale Analysis of Size Effect of Surface Pit Defect in Nanoindentation. Micromachines 2018, 9, 298.

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