Order Article Reprints

Zhang P, Wang L, Zhu K, Yang Y, Fan R, Pan M, Xu S, Xu M, Wang C, Wu C, et al. High Selectivity, Low Damage ICP Etching of p-GaN over AlGaN for Normally-off p-GaN HEMTs Application. Micromachines. 2022; 13(4):589. https://doi.org/10.3390/mi13040589

Zhang, Penghao, Luyu Wang, Kaiyue Zhu, Yannan Yang, Rong Fan, Maolin Pan, Saisheng Xu, Min Xu, Chen Wang, Chunlei Wu, and et al. 2022. "High Selectivity, Low Damage ICP Etching of p-GaN over AlGaN for Normally-off p-GaN HEMTs Application" Micromachines 13, no. 4: 589. https://doi.org/10.3390/mi13040589

Zhang, P., Wang, L., Zhu, K., Yang, Y., Fan, R., Pan, M., Xu, S., Xu, M., Wang, C., Wu, C., & Zhang, D. W. (2022). High Selectivity, Low Damage ICP Etching of p-GaN over AlGaN for Normally-off p-GaN HEMTs Application. Micromachines, 13(4), 589. https://doi.org/10.3390/mi13040589