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Journal: Micromachines, 2021
Volume: 12
Number: 1535

Article: The Method of Low-Temperature ICP Etching of InP/InGaAsP Heterostructures in Cl2-Based Plasma for Integrated Optics Applications
Authors: by Sergey Ishutkin, Vadim Arykov, Igor Yunusov, Mikhail Stepanenko, Vyacheslav Smirnov, Pavel Troyan and Yury Zhidik
Link: https://www.mdpi.com/2072-666X/12/12/1535

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