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Journal: Materials, 2015
Volume: 8
Number: 1704
1704-1713
Article: Teflon/SiO₂ Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process
Authors: by Ching-Lin Fan, Ming-Chi Shang, Bo-Jyun Li, Yu-Zuo Lin, Shea-Jue Wang, Win-Der Lee and Bohr-Ran Hung
Link: https://www.mdpi.com/1996-1944/8/4/1704

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