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Journal: Materials, 2014
Volume: 7
Number: 1249

Article: Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films
Authors: by Mateusz Śmietana, Robert Mroczyński and Norbert Kwietniewski
Link: https://www.mdpi.com/1996-1944/7/2/1249

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