Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method
Abstract
:1. Introduction
2. Experimental Section
Variable | Design number | ||
---|---|---|---|
1 | 2 | 3 | |
A: Temperature of substrate (°C) | 220 | 320 | 420 |
B: Arc current (A) | 60 | 80 | 100 |
C: Bias voltage (V) | -100 | -450 | -800 |
D: Working pressure (torr) | 5×10-1 | 5×10-2 | 5×10-3 |
E: Pre-treatment voltage (V) | -100 | -450 | -800 |
F: Pre-treatment time (minute) | 5 | 10 | 15 |
Sample No. | Variable | |||||
---|---|---|---|---|---|---|
A | B | C | D | E | F | |
1 | 1 | 1 | 1 | 1 | 1 | 1 |
2 | 1 | 2 | 2 | 2 | 2 | 2 |
3 | 1 | 3 | 3 | 3 | 3 | 3 |
4 | 2 | 1 | 1 | 2 | 2 | 3 |
5 | 2 | 2 | 2 | 3 | 3 | 1 |
6 | 2 | 3 | 3 | 1 | 1 | 2 |
7 | 3 | 1 | 2 | 1 | 3 | 2 |
8 | 3 | 2 | 3 | 2 | 1 | 3 |
9 | 3 | 3 | 1 | 3 | 2 | 1 |
10 | 1 | 1 | 3 | 3 | 2 | 2 |
11 | 1 | 2 | 1 | 1 | 3 | 3 |
12 | 1 | 3 | 2 | 2 | 1 | 1 |
13 | 2 | 1 | 2 | 3 | 1 | 3 |
14 | 2 | 2 | 3 | 1 | 2 | 1 |
15 | 2 | 3 | 1 | 2 | 3 | 2 |
16 | 3 | 1 | 3 | 2 | 3 | 1 |
17 | 3 | 2 | 1 | 3 | 1 | 2 |
18 | 3 | 3 | 2 | 1 | 2 | 3 |
3. Results and Discussion
3.1. Deposition rate of TiAlN films
3.2. Hardness of TiAlN films
3.3. The adhesion strength of TiAlN films
3.4. Effects of deposition rate, hardness and structure of TiAlN films on adhesion strength
4. Conclusions
Acknowledgements
References
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Joo, Y.-K.; Zhang, S.-H.; Yoon, J.-H.; Cho, T.-Y. Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method. Materials 2009, 2, 699-709. https://doi.org/10.3390/ma2020699
Joo Y-K, Zhang S-H, Yoon J-H, Cho T-Y. Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method. Materials. 2009; 2(2):699-709. https://doi.org/10.3390/ma2020699
Chicago/Turabian StyleJoo, Yun-Kon, Shi-Hong Zhang, Jae-Hong Yoon, and Tong-Yul Cho. 2009. "Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method" Materials 2, no. 2: 699-709. https://doi.org/10.3390/ma2020699