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Journal: Materials, 2024
Volume: 17
Number: 5952

Article: Deposition Contribution Rates and Simulation Model Refinement for Polysilicon Films Deposited by Large-Sized Tubular Low-Pressure Chemical Vapor Deposition Reactors
Authors: by Jicheng Zhou, Jianyong Zhan, Bowen Lv, Yan Guo and Bingchun Jiang
Link: https://www.mdpi.com/1996-1944/17/23/5952

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