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Journal: Materials, 2024
Volume: 17
Number: 5952
Article:
Deposition Contribution Rates and Simulation Model Refinement for Polysilicon Films Deposited by Large-Sized Tubular Low-Pressure Chemical Vapor Deposition Reactors
Authors:
by
Jicheng Zhou, Jianyong Zhan, Bowen Lv, Yan Guo and Bingchun Jiang
Link:
https://www.mdpi.com/1996-1944/17/23/5952
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