Lee, C.-J.; Kim, J.; Lee, G.-H.; Hyeon, J.; Choi, Y.; Cho, N.
Swelling Behavior of Acrylate-Based Photoresist Polymers Containing Cycloaliphatic Groups of Various Sizes. Materials 2024, 17, 5465.
https://doi.org/10.3390/ma17225465
AMA Style
Lee C-J, Kim J, Lee G-H, Hyeon J, Choi Y, Cho N.
Swelling Behavior of Acrylate-Based Photoresist Polymers Containing Cycloaliphatic Groups of Various Sizes. Materials. 2024; 17(22):5465.
https://doi.org/10.3390/ma17225465
Chicago/Turabian Style
Lee, Choong-Jae, Jinyoung Kim, Geon-Ho Lee, Jayoung Hyeon, Yura Choi, and Namchul Cho.
2024. "Swelling Behavior of Acrylate-Based Photoresist Polymers Containing Cycloaliphatic Groups of Various Sizes" Materials 17, no. 22: 5465.
https://doi.org/10.3390/ma17225465
APA Style
Lee, C.-J., Kim, J., Lee, G.-H., Hyeon, J., Choi, Y., & Cho, N.
(2024). Swelling Behavior of Acrylate-Based Photoresist Polymers Containing Cycloaliphatic Groups of Various Sizes. Materials, 17(22), 5465.
https://doi.org/10.3390/ma17225465